Nishikawa Y | Materials And Devices Research Laboratories Toshiba Corporation
スポンサーリンク
概要
関連著者
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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Nishikawa Y
Toshiba Corp. Kawasaki Jpn
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NAKATA Yoshiaki
Fujitsu Laboratories Ltd.
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Nakata Yoshiaki
Fujitsu Laboratories Limited
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Nishikawa Yukie
Corporate Research & Development Center Toshiba Corporation
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Muto S
Kek Ibaraki
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Nishikawa Yukie
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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Yokoyama N
Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Department of Pediatrics, Kobe University Graduate School of Medicine
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Muto Shigeki
Department Of Physics School Of Science Tokai University
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武藤 真三
山梨大学
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SUGIYAMA Yoshihiro
Fujitsu Limited
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MUTO Shunichi
Fujitsu Laboratories Ltd.
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Sugiyama Y
Fujitsu Laboratories Ltd.
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Sugiyama Yoshinobu
Fujitsu Laboratories Ltd.
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Nakata Y
Fujitsu Laboratories Ltd.
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INATA Tsuguo
Fujitsu Laboratories Ltd.
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Ishikawa T
Riken Harima Institute
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TACKEUCHI Atsushi
Fujitsu Laboratories Ltd.
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Okajima M
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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HATAKOSHI Gen-ichi
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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Onomura M
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Okajima M
Toshiba Corp. Kawasaki
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Hatakoshi Gen-ichi
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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武藤 真三
山梨大学工学部
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MUTO Shunichi
Department of Applied Physics, Hokkaido University
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Ishikawa M
Institute For Solid State Physics The University Of Tokyo
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Ishikawa Mitsuo
Department Of Chemical Technology Kurashiki University Of Science And Arts
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Ishikawa Masayuki
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Ishikawa M
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Wada Osamu
Materials & Electronic Device Laboratory Mitsubishi Electric Corporation
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Sugawara Mitsuru
北海道大学 薬学研究臨床薬剤学
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Wada Osamu
FESTA Laboratories
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Wada O
The Department Of Electrical And Electronics Engineering Kobe University
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Wada Osamu
Fujitsu Laboratories
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Wada O
The Femtosecond Technology Research Association:the Kobe University.
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FUJII Toshio
Fujitsu Laboratories Ltd.
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Sugawara M
Fujitsu Laboratories Ltd.
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Fujii Toshio
Fujitsu Laboratories Lid.
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Nakata Yoshinori
Microgravity Materials Science Group Institute For Materials And Chemical Process National Institute
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Wada Osamu
The Femtosecond Technology Research Association:the Kobe University.
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Sugawara M
Semiconductor Company Sony Corporation
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Sugawara M
Fujitsu Limited And Fujitsu Laboratories Limited
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FUTATSUGI Toshiro
Fujitsu Laboratories Ltd.
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Sugawara Mitsuru
Fujitsu Limited And Fujitsu Laboratories Limited
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NISHIKAWA Yuji
Fujitsu Laboratories Ltd.
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WADA Osamu
Fujitsu Laboratories Ltd.
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Wada Osamu
Fujitsu Laboratories Limited
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ITAYA Kazuhiko
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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NISHIKAWA Yukie
Research and Development Center, Toshiba Corporation
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OKAJIMA Masaki
Research and Development Center, Toshiba Corporation
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Okajima Masaki
Research And Development Center Toshiba Corporation
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Itaya K
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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HIYAMIZU Satoshi
Graduate School of Engineering Science, Osaka University
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Nishikawa Yukie
Research & Development Center Toshiba Corporation
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Hiyamizu Satoshi
Fujitsu Limited
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Hiyamizu Satoshi
Fujitsu Laboratories Limited
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Sugawara Mitsuru
Fujitsu Laboratories Ltd.
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Itaya Kazuhiko
Materials And Devices Research Laboratories Research And Development Center Toshiba Corporation
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Segawa Yusaburo
Photodynamics Research Center Riken (institute Of Physical And Chemical Research)
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Nitta K
Kobe Univ. Kobe Jpn
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Futatsugi T
Fujitsu Laboratories Ltd.
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HAGA Tetsuya
Department of Applied Physics, Hokkaido University
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MUKAI Kohki
Optical Semiconductor Devices Labs, Fujitsu Laboratories Ltd.
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HORIGUCHI Naoto
Fujitsu Laboratories Ltd.
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IMAMURA Kenichi
Fujitsu Laboratories Ltd.
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Imamura K
Fujitsu Lab. Ltd. Kanagawa Jpn
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Haga T
Ntt Telecommunications Energy Lab. Kanagawa Jpn
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SAITO Shinji
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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HATAKOSHI Gen-ichi
Research and Development Center, Toshiba Corporation
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NITTA Koichi
Research and Development Center, Toshiba Corporation
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ITAYA Kazuhiko
Research and Development Center, Toshiba Corporation
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ISHIKAWA Masayuki
Research and Development Center, Toshiba Corporation
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Mukai K
Univ. Tokyo Chiba Jpn
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Itaya Kazuhiko
Research And Development Center Toshiba Corporation
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Saito S
Chiba Univ. Chiba Jpn
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FUKUSHIMA Noburu
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Saito S
Kogakuin Univ. Tokyo Jpn
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Imamura Kimitake
Faculty Of Engineering Yokohama National University
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Ishikawa Takatoshi
Department Of Applied Physics Faculty Of Science Fukuoka University
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Saito Sakae
Central Research Laboratory Hitachi Ltd.
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USUKI Tatsuya
Fujitsu Laboratories Ltd.
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Matsushita Daisuke
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Matsushita Daisuke
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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AWANO Yuji
Fujitsu Ltd.
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MATSUMURA Naoki
Department of Applied Physics, Hokkaido University
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ISHIKAWA Hiroshi
Fujitsu Laboratories Ltd.
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MUKAI Kohki
Fujitsu Laboratories Ltd.
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YAMAGUCHI Masaomi
Fujitsu Limited
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MANKAD Tanaya
Materials Department, University of California
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PETROFF Pierre
Materials Department, University of California
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ENDOH Akira
Fujitsu Laboratories Ltd.
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MUTO Shunichi
Faculty of Engineering, Hokkaido University
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Usuki Tatsuya
Department Of Applied Physics Osaka University
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Usuki Tatsuya
Fujitsu Lab. Ltd. Atsugi Jpn
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Shiramine Ken-ichi
Department Of Applied Physics Hokkaido University
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Yamaguchi Masaomi
Fujitsu Lab. Ltd. Kanagawa Jpn
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Yasuda N
Tokyo Inst. Technol. Tokyo
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Petroff P
Univ. California California Usa
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Petroff Pierre
Materiais And Electrical And Computer Engineering University Of Callfornia
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Petroff Pierre
Materials Department University Of California Santa Barbara
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NISHIKAWA Yukie
Toshiba Corporation, Materials and Devices Research Laboratories
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SAITO Shinji
Materials and Devices Research Laboratories, Toshiba Corporation
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NISHIKAWA YUKIE
Materials and Devices Research Laboratories, Toshiba Corporation
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ISHIKAWA Masayuki
Materials and Devices Research Laboratories, Toshiba Corporation
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Awano Yuji
Fujitsu Lab. Ltd. Kanagawa Jpn
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Awano Y
Fujitsu Ltd. Atsugi Jpn
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Awano Yuji
Fujitsu Laboratories Ltd.
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Mankad Tanaya
Materials Department University Of California
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Yasuda Naoki
Corporate Research & Development Center Toshiba Corporation
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YAMAGUCHI Takeshi
Advanced LSI Technology Laboratory, Toshiba Corporation
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Ishikawa T
National Space Dev. Agency Of Japan Ibaraki Jpn
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Ishikawa T
Kyushu Univ. Fukuoka Jpn
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Ohnishi Hiroaki
Fujitsu Laboratories Ltd.
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Ishikawa Tetsuya
Riken Harima Institute
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Matsumura Naoki
Department Of Applied Physics Hokkaido University
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Matsumura N
Kyoto Inst. Technol. Kyoto Jpn
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Ohnishi H
Taihei Kogyo Co. Ltd. Himeji Jpn
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Usuki T
Fujitsu Lab. Ltd. Atsugi Jpn
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SCHIMIZU Tatsuo
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Ohnishi Hiroaki
Division Of Hematology Faculty Of Medicine Kagawa University
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Schimizu T
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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Schimizu Tatsuo
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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TAKATSU Motomu
Fujitsu Laboratories Ltd.
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Endoh Akira
National Inst. Of Information And Communications Technol. (nict) Koganei‐shi Jpn
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Akiyama Tomoyuki
Qd Laser Inc.
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武藤 俊介
大阪大学教養部
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NUMATA Ken
Kanagawa High-Technology Foundation
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YABUTA Konami
Kanagawa High-Technology Foundation
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HATORI Nobuyuki
Fujitsu Laboratories Ltd.
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AKIYAMA Tomoyuki
Femtosecond Technology Research Association
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OHSHIMA Toshio
Fujitsu Laboratories Ltd.
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SASAKURA Hirotaka
Department of Applied Physics, Faculty of Engineering Hokkaido University
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NAKAGAWA Yuji
Tokyo Institute of Technology
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SUGAWARA Mitsuru
Tokyo Institute of Technology
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NAKATA Yoshiaki
Optical Semiconductor Devices Labs, Fujitsu Laboratories Ltd.
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ISHIKAWA Hiroshi
Tokyo Institute of Technology
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ISHIGURE Tsuyoshi
Department of Applied Physics, Hokkaido University
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SHIRAMINE Ken-ichi
Department of Applied Physics, Hokkaido University
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HORISAKI Yasunobu
Department of Applied Physics, Hokkaido University
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SUZUKI Dai
Department of Applied Physics, Hokkaido University
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ITOH Satoru
Department of Applied Physics, Hokkaido University
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EBIKO Yoshiki
Department of Applied Physics, Hokkaido University
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Kataoka Mayako
Department of Applied Physics, Hokkaido University
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SHOJI Hajime
Fujitsu Laboratories Ltd.
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Tackeuchi Atsushi
Department Of Applied Physics Waseda University
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Kuroda Takamasa
Department of Applied Physics, Waseda University
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Yamaguchi Masaomi
Fujitsu Laboratories Ltd.
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Sasakura Hirotaka
Department Of Applied Physics Faculty Of Engineering Hokkaido University
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Yamaguchi M
Fujitsu Laboratories Ltd.
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Ikegawa Sumio
Corporate Research & Development Center Toshiba Corporation
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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ONOMURA Masaaki
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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ISHIKAWA Masayuki
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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RENNIE John
Toshiba Materials and Devices Laboratories
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ONOMURA Masaaki
Materials and Devices Research Laboratories, Toshiba Corporation
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PARBROOK Peter
Materials and Devices Research Laboratories, Toshiba Corporation
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HATAKOSHI Gen-ichi
Materials and Devices Research Laboratories, Toshiba Corporation
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HATAKOSHI Genichi
Materials and Devices Research Laboratories, Research and Development Certter, Toshiba Corporation
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WATANABE Minoru
Toshiba Research and Development Center
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OKAJIMA Masaki
Toshiba Research and Development Center
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NITTA Koichi
Toshiba Research and Development Center
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Suzuki M
Shizuoka Univ. Hamamatsu
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Okajima Masaki
Toshiba Research & Development Center
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Itoh Satoru
Department Of Applied Physics Hokkaido University
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Endoh A
Fujitsu Lab. Ltd. Atsugi Jpn
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Itoh S
Futaba Corp. Chiba Jpn
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Ebiko Y
Fujitsu Lab. Ltd. Atsugi Jpn
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Ebiko Yoshiki
Department Of Applied Physics Hokkaido University
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Rennie John
Materials And Devices Research Laboratories Toshiba Corporation
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Parbrook P
Toshiba Corp. Kawasaki Jpn
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FUKUSHIMA Noburu
Corporate R&D Center, Toshiba Corporation
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Yasuda Naoki
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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YAMAGUCHI Yasuhiro
Fujitsu Laboratories Ltd.
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SATAKE Hideki
Advanced LSI Technology Laboratory Research & Development Center, Toshiba Co.
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SATOU Nobutaka
Toshiba Nanoanalysis Corporation
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NAKAYAMA Kohei
Corporate Research & Development Center, Toshiba Corporation
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SASA Shigehiko
Fujitsu Laboratories Ltd.
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Saito Shinji
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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SUZUKI Mariko
Research and Development Center, Toshiba Corporation
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Nakayama Kohei
Corporate Research & Development Center Toshiba Corporation
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Itaya Kazuhiko
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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NAKAMURA Satoshi
Fujitsu Laboratories Ltd.
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Yoshiki Masahiko
Toshiba Nanoanalysis Corporation
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Horisaki Yasunobu
Department Of Applied Physics Hokkaido University
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Suzuki Mariko
Advanced Semiconductor Devices Research Laboratories R&d Center Toshiba Corporation
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Sasa S
Fujitsu Laboratories Ltd.
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Suzuki Dai
Department Of Applied Physics Hokkaido University
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Itoh S
Kyushu Univ. Kasuga Jpn
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Satake Hideki
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Sasa Shigehiko
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Ohshima T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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小崎 完
北大
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Kozaki Tamotsu
Hokkaido University Graduate School Of Engineering Division Of Energy And Environmental Systems
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Kataoka Mayako
Department Of Applied Physics Hokkaido University
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Takashima Akira
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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SUZUKI Masamichi
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation
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Suzuki M
Department Of Electronics Graduate School Of Engineering Tohoku University
著作論文
- Size, density, and shape of InAs quantum dots in closely stacked multilayers grown by the Stranski-Krastanow mode
- Lattice Deformation and Ga Diffusion Concerning InAs Self-Assembled Quantum Dots on GaAs(100) as a Function of Growth Interruption Time
- Quantum-Dot Semiconductor Optical Amplifiers for High Bit-Rate Signal Processing over 40Gbit/s
- A Model of Carrier Capturing and Recombination Process in Quantum-Dot System : Influence of Excitation Power on Spontaneous Emission Intensity and Lifetime
- InAs Self-Assembled Quantum Dots Coupled with GaSb Monolayer Quantum Well
- Lasing Characteristics and Carrier Dynamics of 1.3-μm InGaAs/GaAs Quantum Dot Lasers
- Quantum Dot Infrared Photodetector Using Modulation Doped InAs Self-Assembled Quantum Dots
- Effect of Size Fluctuations on the Photoluminescence Spectral Linewidth of Closely Stacked InAs Self-Assembled Quantum Dot Structures
- Crystallographic Properties of Closely Stacked InAs Quantum Dots Investigated by Ion Channeling
- Threading Dislocations in Multilayer Structure of InAs Self-Assembled Quantum Dots
- Dynamic Properties of InAs Self-Assembled Quantum Dots Evaluated by Capacitance-Voltage Measurements
- Interdiffusion between InAs Quantum Dots and GaAs Matrices
- Narrow Photoluminescemce Line Width of Closely Stacked InAs Self-Assembled Quantum Dot Structures
- Self-Formed InGaAs Quantum Dot Lasers with Multi-Stacked Dot Layer
- New Optical Memory Structure Using Self-Assembled InAs Quantum Dots
- Time-Resolved Study of Carrier Transfer among InAs/GaAs Multi-Coupled Quantum Dots
- Stacked InAs Self-Assembled Quantum Dots on (001) GaAs Grown by Molecular Beam Epitaxy
- InAs/GaAs Multi-Coupled Quantum Dots Structure Enabling High-Intensity, Near-1.3-μm Emission due to Cascade Carrier Tunneling
- Electron Spin-relaxation Dynamics in GaAs/AlGaAs Quantum Wells and InGaAs/InP Quantum Wells
- Performance of All-Optical Switch Utilizing the Spin-Dependent Transient Rotation in a Multiple-Quantum-Well Etalon
- Large Lateral Modulation in InAs/GaAs In-Plane Strained Superlattice on Slightly Misoriented (110) InP Substrate
- Stacked InAs Self-Assembled Quantum Dots on (001) GaAs Grown by Molecular Beam Epitaxy
- Quantum Dots Infrared Photodetector Using Modulation Doped InAs Self-Assembled Quantum Dots
- The Influence of Surface Treatment on the Quality of Pd/Au Contacts to p-type ZnSe
- Surface Preparation Effects for Molecular Beam Epitaxial Growth of ZnSe Layers on InGaP Layers
- Highly Reliable Operation of InGaP/InGaAlP Multi-Quantum-Well Visible Laser Diodes
- High-Power InGaAIP Laser Diodes for High-Density Optical Recording : Visible Lasers
- High-Power InGaAlP Laser Diodes for High-Density Optical Recording
- Reliable High-Power Operation of InGaAlP Visible Light Laser Diodes with Strained Active Layer
- Electrical Properties of Single Crystalline CeO_2 High-k Gate Dielectrics Directly Grown on Si(111)
- Direct Growth of Single Crystalline CeO_2 High-k Gate Dielectrics
- Effects of Growth Parameters on Oxygen Incorporation into InGaAlP Grown by Metalorganic Chemical Vapor Deposition
- Near-1.3-μm High-Intensity Photoluminescence at Room Temperature by InAs/GaAs Multi-Coupled Quantum Dots
- Fast Recovery from Excitonic Absorption Bleaching in Type-II : GaAs/AlGaAs/AlAs Tunneling Biquantum Well
- Quantum Well Width Dependence of Negative Differential Resistance of In_Al_As/In_Ga_As Resonant Tunneling Barriers Grown by MBE
- Conduction Band Edge Discontinuity of In_Ga_As/In_(Ga_1 _xAl_x)_As(0≦x≦1) Heterostructures
- Enhancement of Nitrogen Incorporation in ZnSe Grown on Misoriented GaAs Substrates by Molecular Beam Epitaxy
- High quality La aluminates/Si (100) interface realized by passivation of Si dangling bonds with one monolayer epitaxial SrSi_2
- A Pseudomorphic In_Ga_As/AlAs Resonant Tunneling Barrier with a Peak-to-Valley Current Ratio of 14 at Room Temperature
- Enhancement of Dielectric Constant due to Expansion of Lattice Spacing in CeO_2 Directly Grown on Si(111)
- Excellent Negative Differential Resistance of InAlAs/InGaAs Resonant Tunneling Barrier Structures Grown by MBE
- Negative Differential Resistance of Strain-Free InGaAs/AlAsSb Resonant Tunneling Barrier Structures Lattice-Matched to InP
- Fabrication of Sub-100 nm Wires and Dots in GaAs/AlGaAs Multiquantum Well Using Focused Ion Beam Lithography