MUTO Shunichi | Fujitsu Laboratories Ltd.
スポンサーリンク
概要
関連著者
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MUTO Shunichi
Fujitsu Laboratories Ltd.
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Muto S
Kek Ibaraki
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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Nishikawa Y
Toshiba Corp. Kawasaki Jpn
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INATA Tsuguo
Fujitsu Laboratories Ltd.
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Ishikawa T
Riken Harima Institute
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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Nakata Yoshiaki
Fujitsu Laboratories Limited
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Hiyamizu Satoshi
Fujitsu Laboratories Limited
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NAKATA Yoshiaki
Fujitsu Laboratories Ltd.
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TACKEUCHI Atsushi
Fujitsu Laboratories Ltd.
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Hiyamizu Satoshi
Fujitsu Limited
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Tackeuchi A
Department Of Applied Physics Waseda University
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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Muto Shigeki
Department Of Physics School Of Science Tokai University
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HIYAMIZU Satoshi
Graduate School of Engineering Science, Osaka University
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SUGIYAMA Yoshihiro
Fujitsu Limited
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Sugiyama Y
Fujitsu Laboratories Ltd.
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武藤 真三
山梨大学
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Sugiyama Yoshinobu
Fujitsu Laboratories Ltd.
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Sugiyama Yoshihiro
Fujitsu Laboratories Ltd.
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Yokoyama Naoki
Department of Pediatrics, Kobe University Graduate School of Medicine
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Fujii Toshio
Fujitsu Laboratories Lid.
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Ishikawa Takatoshi
Department Of Applied Physics Faculty Of Science Fukuoka University
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FUJII Toshio
Fujitsu Laboratories Ltd.
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Yokoyama N
Fujitsu Laboratories Ltd.
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Nishikawa Yukie
Corporate Research & Development Center Toshiba Corporation
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Yokoyama Naoki
Institute For Nano Quantum Information Electronics The University Of Tokyo
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Wada Osamu
Materials & Electronic Device Laboratory Mitsubishi Electric Corporation
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IMAMURA Kenichi
Fujitsu Laboratories Ltd.
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NISHIKAWA Yuji
Fujitsu Laboratories Ltd.
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WADA Osamu
Fujitsu Laboratories Ltd.
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Wada Osamu
FESTA Laboratories
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Imamura K
Fujitsu Lab. Ltd. Kanagawa Jpn
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Wada O
The Department Of Electrical And Electronics Engineering Kobe University
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Wada Osamu
Fujitsu Laboratories Limited
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Wada Osamu
Fujitsu Laboratories
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Wada O
The Femtosecond Technology Research Association:the Kobe University.
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Ishikawa T
National Space Dev. Agency Of Japan Ibaraki Jpn
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Imamura Kimitake
Faculty Of Engineering Yokohama National University
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Wada Osamu
The Femtosecond Technology Research Association:the Kobe University.
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Muto Shunichi
Fujitsu Limited
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KONDO Kazuhiro
Fujitsu Limited
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Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
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SASA Shigehiko
Fujitsu Laboratories Ltd.
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Kondo Kazuhiro
Fujitsu Laboratories Ltd.
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Kondo K
Fujitsu Laboratories Ltd.
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Ohnishi Hiroaki
Fujitsu Laboratories Ltd.
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Sasa S
Fujitsu Laboratories Ltd.
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Ohnishi H
Taihei Kogyo Co. Ltd. Himeji Jpn
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Sasa Shigehiko
Nanomaterials Microdevices Research Center Osaka Institute Of Technology
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Ohnishi Hiroaki
Division Of Hematology Faculty Of Medicine Kagawa University
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HARAGUCHI Masanobu
Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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FUKUI Masuo
Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
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USUKI Tatsuya
Fujitsu Laboratories Ltd.
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Endoh Akira
National Inst. Of Information And Communications Technol. (nict) Koganei‐shi Jpn
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ENDOH Akira
Fujitsu Laboratories Ltd.
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Usuki Tatsuya
Department Of Applied Physics Osaka University
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Usuki Tatsuya
Fujitsu Lab. Ltd. Atsugi Jpn
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Endoh A
Fujitsu Lab. Ltd. Atsugi Jpn
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Fukui M
Nakanihon Automotive Coll. Gifu
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YAMAGUCHI Yasuhiro
Fujitsu Laboratories Ltd.
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Nishi Hidetoshi
Fujitsu Limited
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Ishikawa T
Kyushu Univ. Fukuoka Jpn
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TAMURA Hirotaka
Fujitsu Laboratory Ltd.
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Fukui Masao
Department Of Optical Science And Technology Faculty Of Engineering The University Of Tokushima
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Yokoyama Naoki
Fujitsu Limited
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Ishikawa Tetsuya
Riken Harima Institute
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Fukui Masuo
Department Of Electronics Faculty Of Engineering University Of Tokushima
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Fukui Masuo
Department Of Electrical And Electronic Engineering Faculty Of Engineering The University Of Tokushi
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Usuki T
Fujitsu Lab. Ltd. Atsugi Jpn
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Tamura Hirotaka
Fujitsu Laboratories Ltd.
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Nishi Hidetoshi
Fujitsu Laboratories Limited
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Arimoto H
Fujitsu Lab. Ltd. Atsugi Jpn
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Arimoto Hiroshi
Fujitsu Laboratories Limited
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Haraguchi Masanobu
Department Of Electrical And Electronic Engineering Faculty Of Engineering The University Of Tokushi
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Yamaguchi Yasuhiro
Fujitsu Laboratories Lid.
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KOMIYA Satoshi
Fujitsu Laboratories Ltd.
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FUTATSUGI Toshiro
Fujitsu Laboratories Ltd.
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YAMAGUCHI Masaomi
Fujitsu Limited
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OHSHIMA Toshio
Fujitsu Laboratories Ltd.
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Iida Atsuo
Photon Factory, Institute of Materials Structure Science
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Tackeuchi Atsushi
Max-planck-institut Fur Festkorperforschung:(permanent Address)fujitsu Laboratories Ltd.
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HEBERLE Albert
Max-Planck-Institut fur Festkorperforschung
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RUHLE Wolfgang
Max-Planck-Institut fur Festkorperforschung
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KOHLER Klaus
Fraunhofer-Institut fur Angewandte Festkorperphysik
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Yamaguchi Masaomi
Fujitsu Lab. Ltd. Kanagawa Jpn
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Yamaguchi Masaomi
Fujitsu Laboratories Ltd.
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SAKUMA Yoshiki
Fujitsu limited
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OSAMURA Kozo
Department of Metallurgy,Kyoto University
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Yamaguchi M
Fujitsu Laboratories Ltd.
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Hashimoto Hisao
Fujitsu Limited
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NANBU Kazuo
Fujitsu Laboratories Ltd.
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ISHIKAWA Tomonori
Fujitsu Laboratories LTD.
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SHIBATOMI Akihiro
Fujitsu Limited
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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Iida Atsuo
Photon Factory Institute Of Materials Structure Science
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Nanbu Kazuo
Fujitsu Laboratories Limited
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Osamura Kozo
Department Of Metallurgy Kyoto University
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Muto Shunichi
Fujitsu Ltd.
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Komiya Satoshi
Fujitsu Laboratories Lid.
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Komiya Satoshi
Fujitsu Ltd.
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UMEBU Itsuo
Fujitsu Laboratories Limited
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YAMAGUCHI Masahito
Department of Electronics, School of Engineering, Nagoya University, Chikusa-ku, Nagoya
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Nakagawa Y
Yamanashi Univ. Kofu Jpn
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Nakagawa Y
The University Of Tokushima Faculty Of Engineering Optical Science And Technology Department
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Hamaguchi Chihiro
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Hamaguchi Chihiro
Deparimsnt Of Elecironics Facully Of Engineering Osaka University
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MATSUSHIMA Wataru
Department of Metallurgy, Kyoto University
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BOHM Gerhard
Walter Schottky Institute, Technische Universitat Miinchen
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ARIMOTO Hiroshi
Fujitsu Laboratories Ltd.
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ISHIKAWA Hideaki
Fujitsu Laboratories Ltd.
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OSAMURA Kozo
Research Institute for Applied Sciences
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Morifuji Masato
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Fujii Toshio
Fujitsu Laboratories Limited
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NAKAMURA Satoshi
Fujitsu Laboratories Ltd.
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Ishikawa T
Fujitsu Laboratories Ltd.
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Nakata Yoshinori
Microgravity Materials Science Group Institute For Materials And Chemical Process National Institute
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Sakuma Yoshiki
Fujitsu Laboratories Ltd.
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Ishikawa Tomonori
Fujitsu Limited
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Ishikawa Tomonori
Fujitsu Laboratories Limited
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Matsushima Wataru
Department Of Metallurgy Kyoto University
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Shibatomi Akihiro
Fujitsu Laboratories Limited
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Nakata Y
Fujitsu Laboratories Ltd.
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YOSHIDA Akira
Fujitsu Limited
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Fujii T
Central Research Institute Of Electric Power Industry
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Osamura K
Department Of Materials Science And Engineering Kyoto University
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Trankle Gunter
Walter Schottky Institut Technische Universitat Munchen
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Weimann Gunter
Walter Schottky Institut Technische Universitat Munchen
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Umebu I
Fujitsu Ltd.
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Bohm Gerhard
Walter Schottky Institut Technische Universitat Munchen
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Hasuo Shinya
Fujitsu Laboratories Ltd.
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Kohler Klaus
Fraunhofe-institut Fur Angewandte Festkorperphysik
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Miyauchi Eizo
Fujitsu Laboratories Ltd.
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Ohshima T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Tanaka C
Fujitsu Ltd.
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TANAKA Chikako
Fujitsu Ltd.
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Carlo Aldo
Walter Schottky Institut Technische Universitat Munchen
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NAGASAWA Hidekazu
Department of Electronic Engineering, Faculty of Engineering, Osaka University
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VOGL Peter
Walter Schottky Institut, Technische Universitat Munchen
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Vogl Peter
Walter Schottky Institut Technische Universitat Munchen
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Nanbu K
Fujitsu Laboratories Ltd.
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Shibatomi A
Fujitsu Lab. Ltd. Atsugi Jpn
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Futatsugi T
Fujitsu Laboratories Ltd.
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NAKAGAWA Yoshinori
Department of Electrical and Electronic Engineering, Faculty of Engineering, University of Tokushima
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YAMAMOTO Naoki
Physics Department,Tokyo Institute of Technology
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Hashimoto Hisao
Fujitsu Laboratories Limited
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Tamura Hirotaka
Fujitsu Limited
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Yamaguchi Masahito
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Mori Toshihiko
Fujitsu Laboratories Ltd.
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Nishi H
Fujitsu Limited
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Nagasawa Hidekazu
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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KITADA Hideki
Fujitsu Laboratories Ltd
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Kitada H
Fujitsu Laboratories Ltd
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Mori Toshihiko
Fujitsu Limited
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Nakagawa Yoshinori
Department Of Electrical And Electronic Engineering Faculty Of Engineering University Of Tokushima
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Yamaguchi Yasuhiro
Fujitsu Laboratories Ltd
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Osamura Kozo
Department Of Materials Science And Engineering Kyoto University
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Yoshida Akira
Fujitsu Laboratories Ltd.
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Yamamoto Naoki
Physics Department Tokyo Institute Of Technology
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Nakamura Satoshi
Fujitsu Laboratories Limited
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YAMAGUCHI Masahito
Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University
著作論文
- Time-Resolved Study of Carrier Transfer among InAs/GaAs Multi-Coupled Quantum Dots
- Stacked InAs Self-Assembled Quantum Dots on (001) GaAs Grown by Molecular Beam Epitaxy
- InAs/GaAs Multi-Coupled Quantum Dots Structure Enabling High-Intensity, Near-1.3-μm Emission due to Cascade Carrier Tunneling
- Performance of All-Optical Switch Utilizing the Spin-Dependent Transient Rotation in a Multiple-Quantum-Well Etalon
- Large Lateral Modulation in InAs/GaAs In-Plane Strained Superlattice on Slightly Misoriented (110) InP Substrate
- Band-Gap Renormalization and Excitonic Effects in Tunneling in Asymmetric Double Quantum Wells
- Novel InGaAs/GaAs Quantum Dot Structures Formed in Tetrahedral-Shaped Recesses on (111) B GaAs Substrate Using Metalorganic Vapor Phase Epitaxy
- A Resonant-Tunneling Bipolar Transistor (RBT) : A New Functional Device with High Current Gain
- A New Functional, Resonant-Tunneling Hot Electron Transistor (RHET)
- Tunneling Hot Electron Transistor Using GaAs/AlGaAs Heterojunctions
- Structure Analysis of GaAs-AlAs Superlattice Grown by Molecular Beam Epitaxy
- Effect of H_2 on the Quality of Si-Doped Al_xGa_As Grown by MBE
- Near-1.3-μm High-Intensity Photoluminescence at Room Temperature by InAs/GaAs Multi-Coupled Quantum Dots
- Differences in Tunneling Time between 77 K and Room Temperature for Tunneling Biquantum Wells
- Fast Recovery from Excitonic Absorption Bleaching in Type-II : GaAs/AlGaAs/AlAs Tunneling Biquantum Well
- Quantum Well Width Dependence of Negative Differential Resistance of In_Al_As/In_Ga_As Resonant Tunneling Barriers Grown by MBE
- Conduction Band Edge Discontinuity of In_Ga_As/In_(Ga_1 _xAl_x)_As(0≦x≦1) Heterostructures
- Determination of the GaAs/AlAs Superlattice Period from the First-Order Superlattice Bragg Reflection
- A Pseudomorphic In_Ga_As/AlAs Resonant Tunneling Barrier with a Peak-to-Valley Current Ratio of 14 at Room Temperature
- Back-Gated Field Effect in a Double Two-Dimensional Electron Gas Structure
- Si Atomic-Planar-Doping in GaAs Made by Molecular Beam Epitaxy
- Surface Polaritons Due to the Folded Optical Phonons in GaAs/AlAs Superlattices
- Wannier-Stark Localization in Superlattices
- Photoreflectance Spectra from GaAs Buffer Layer of GaAs/AlAs Multiple Quantum Well/GaAs Buffer/GaAs Substrate
- A Static Random Access Memory Cell Using a Double-Emitter Resonant-Tunneling Hot Electron Transistor for Gigabit-Plus Memory Applications
- Direct Observation of Al_xGa_As/GaAs Superlattices by REM
- Excellent Negative Differential Resistance of InAlAs/InGaAs Resonant Tunneling Barrier Structures Grown by MBE
- Effect of Silicon Doping Profile on I-V Characteristics of an AlGaAs/GaAs Resonant Tunneling Barrier Structure Grown by MBE
- On a Possibility of Wavelength-Domain-Multiplication Memory Using Quantum Boxes
- Schottky Barrier Height of Al n-In_Ga_As and Nb/n-In_Ga_As Diodes
- Time Evolution of Excitonic Absorption Bleaching of Resonant Tunneling Bi-Quantum-Well Structures
- Negative Differential Resistance of Strain-Free InGaAs/AlAsSb Resonant Tunneling Barrier Structures Lattice-Matched to InP
- Fast Recovery of Excitonic Absorption Peaks in Tunneling Bi-Quantum-Well Structures
- Picosecond Characterization of InGaAs/InAlAs Resonant Tunneling Barrier Diode by Electro-Optic Sampling
- Numerical Study of Effect of Fabrication Damage on Carrier Dynamics in MQW Narrow Wires
- Fabrication of Sub-100 nm Wires and Dots in GaAs/AlGaAs Multiquantum Well Using Focused Ion Beam Lithography
- InGaAlAs /InGaAs and InAlAs/InGaAlAs Quantum-Well Structures Grown by MBE Using Pulsed Molecular Beam Method