Fast Recovery from Excitonic Absorption Bleaching in Type-II : GaAs/AlGaAs/AlAs Tunneling Biquantum Well
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-06-01
著者
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NAKATA Yoshiaki
Fujitsu Laboratories Ltd.
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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SUGIYAMA Yoshihiro
Fujitsu Limited
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TACKEUCHI Atsushi
Fujitsu Laboratories Ltd.
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MUTO Shunichi
Fujitsu Laboratories Ltd.
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INATA Tsuguo
Fujitsu Laboratories Ltd.
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Sugiyama Y
Fujitsu Laboratories Ltd.
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Ishikawa T
Riken Harima Institute
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Nishikawa Y
Toshiba Corp. Kawasaki Jpn
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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Muto S
Kek Ibaraki
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NAKAMURA Satoshi
Fujitsu Laboratories Ltd.
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Ishikawa Takatoshi
Department Of Applied Physics Faculty Of Science Fukuoka University
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Sugiyama Yoshinobu
Fujitsu Laboratories Ltd.
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Nakata Yoshiaki
Fujitsu Laboratories Limited
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Sugiyama Yoshihiro
Fujitsu Laboratories Ltd.
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Tackeuchi A
Department Of Applied Physics Waseda University
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Nakamura Satoshi
Fujitsu Laboratories Limited
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