Enhancement of Nitrogen Incorporation in ZnSe Grown on Misoriented GaAs Substrates by Molecular Beam Epitaxy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-03-01
著者
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Nakata Y
Fujitsu Ltd. Atsugi Jpn
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HATAKOSHI Gen-ichi
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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SAITO Shinji
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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SAITO Shinji
Materials and Devices Research Laboratories, Toshiba Corporation
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NISHIKAWA YUKIE
Materials and Devices Research Laboratories, Toshiba Corporation
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ISHIKAWA Masayuki
Materials and Devices Research Laboratories, Toshiba Corporation
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HATAKOSHI Gen-ichi
Materials and Devices Research Laboratories, Toshiba Corporation
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Saito S
Chiba Univ. Chiba Jpn
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Nishikawa Y
Toshiba Corp. Kawasaki Jpn
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Nishikawa Y
Materials And Devices Research Laboratories Toshiba Corporation
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Ishikawa M
Institute For Solid State Physics The University Of Tokyo
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Saito S
Kogakuin Univ. Tokyo Jpn
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Ishikawa Mitsuo
Department Of Chemical Technology Kurashiki University Of Science And Arts
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Hatakoshi Gen-ichi
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Ishikawa Masayuki
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Saito Sakae
Central Research Laboratory Hitachi Ltd.
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Ishikawa M
Toshiba Corporation Advanced Semiconductor Devices Research Laboratories
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Saito Shinji
Nhk Spring Co. Ltd.
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Ishikawa Masayuki
Materials And Devices Research Laboratories Research And Development Center Toshiba Corporation
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