Surface Preparation Effects for Molecular Beam Epitaxial Growth of ZnSe Layers on InGaP Layers

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-05-15

著者

• Nakata Y

  Fujitsu Ltd. Atsugi Jpn

• Okajima M

  Toshiba Corporation Advanced Semiconductor Devices Research Laboratories

• HATAKOSHI Gen-ichi

  Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories

• SAITO Shinji

  Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories

• ONOMURA Masaaki

  Materials and Devices Research Laboratories, Toshiba Corporation

• SAITO Shinji

  Materials and Devices Research Laboratories, Toshiba Corporation

• NISHIKAWA YUKIE

  Materials and Devices Research Laboratories, Toshiba Corporation

• PARBROOK Peter

  Materials and Devices Research Laboratories, Toshiba Corporation

• ISHIKAWA Masayuki

  Materials and Devices Research Laboratories, Toshiba Corporation

• HATAKOSHI Genichi

  Materials and Devices Research Laboratories, Research and Development Certter, Toshiba Corporation

• Onomura M

  Toshiba Corporation Advanced Semiconductor Devices Research Laboratories

• Okajima M

  Toshiba Corp. Kawasaki

• Saito S

  Chiba Univ. Chiba Jpn

• Parbrook P

  Toshiba Corp. Kawasaki Jpn

• Nishikawa Y

  Toshiba Corp. Kawasaki Jpn

• Nishikawa Y

  Materials And Devices Research Laboratories Toshiba Corporation

• Ishikawa M

  Institute For Solid State Physics The University Of Tokyo

• Saito S

  Kogakuin Univ. Tokyo Jpn

• Ishikawa Mitsuo

  Department Of Chemical Technology Kurashiki University Of Science And Arts

• Hatakoshi Gen-ichi

  Toshiba Corporation Advanced Semiconductor Devices Research Laboratories

• Ishikawa Masayuki

  Toshiba Corporation Advanced Semiconductor Devices Research Laboratories

• Saito Sakae

  Central Research Laboratory Hitachi Ltd.

• Ishikawa M

  Toshiba Corporation Advanced Semiconductor Devices Research Laboratories

• Parbrook Peter

  Materials And Devices Research Laboratories Research And Development Certter Toshiba Corporation

• Saito Shinji

  Nhk Spring Co. Ltd.

• Ishikawa Masayuki

  Materials And Devices Research Laboratories Research And Development Center Toshiba Corporation

• Onomura M

  Univ. Tsukuba

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