Thin Film Growth of YBa_2Cu_3O_<7-x> by ECR Oxygen Plasma Assisted Reactive Evaporation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-04-20
著者
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Tsukamoto Akira
Advanced Research Laboratory Hitachi Ltd.
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Takagi K
Advanced Research Laboratory Hitachi Ltd.
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Takagi Kazumasa
Central Research Laboratory Hitachi Ltd.
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Takagi Kazumasa
Advanced Research Laboratory Hitachi Ltd.
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TSUKAMOTO Akira
Central Research Laboratory, Hitachi, Ltd.
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Tsukamoto A
Advanced Research Laboratory Hitachi Ltd.
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Takagi K
Hitachi Ltd. Tokyo Jpn
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SAITO Shinji
Toshiba Corporation, Advanced Semiconductor Devices Research Laboratories
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MIYAUCHI Katsuki
Central Research Laboratory, Hitachi, Ltd.
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Saito S
Chiba Univ. Chiba Jpn
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FUKAZAWA Tokuumi
Advanced Research Laboratory, Hitachi Ltd.
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Imagawa Kazushige
Central Research Laboratory, Hitachi, Ltd.
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AIDA Toshiyuki
Central Research Laboratory, Hitachi, Ltd.
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FUKAZAWA Tokuumi
Central Research Laboratory, Hitachi, Ltd.
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SAITO Sakae
Central Research Laboratory, Hitachi, Ltd.
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SHINDO Keijiro
Central Research Laboratory, Hitachi, Ltd.
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Saito S
Kogakuin Univ. Tokyo Jpn
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Takagi Kazumasa
Central Research Laboratory Hitachi Lid.
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Saito Sakae
Central Research Laboratory Hitachi Ltd.
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Shindo Keijiro
Central Research Laboratory Hitachi Ltd.
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Aida Toshiyuki
Central Research Laboratory Hitachi Ltd.
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Miyauchi K
Central Research Laboratory Hitachi Ltd.
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Aida T
Hitachi Ltd. Tokyo
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Imagawa K
Central Research Laboratory Hitachi Ltd.
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Imagawa Kazushige
Central Research Laboratory Hitachi Ltd.
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Saito Shinji
Nhk Spring Co. Ltd.
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Miyauchi Katsuki
Central Research Laboratory Hitachi Ltd.
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Fukazawa T
Advanced Research Laboratory Hitachi Ltd.
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Fukazawa Tokuumi
Central Research Laboratory Hitachi Ltd.
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