Ultrafast Photoconductive Switches with a 43 nm Gap Fabricated Using an Atomic Force Microscope

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-03-30

著者

• NAKAGAWA Tadashi

  Electrotechnical Laboratory

• Sugiyama Y

  Fujitsu Laboratories Ltd.

• ITATANI Taro

  Electrotechnical Laboratory (ETL)

• Kotaki Y

  Nagaoka University Of Technology

• Kotaki Yuichi

  School Of Fisheries Sciences Kitasato University

• Matsumoto K

  Nippon Sanso Corp. Ibaraki Jpn

• Matsumoto K

  Electrotechnical Lab. Ibaraki‐kenn Jpn

• Matsumoto Kazuhiko

  Electrotechnical Laboratory (etl)

• Matsumoto Kazuhiko

  Advanced Industrial Science And Technology:tsukuba University:crest

• SUGIYAMA Yoshinobu

  Electrotechnical Laboratory

• Kotaki Yuichi

  Nagaoka University Of Technology

• UCHIKI Hisao

  Nagaoka University of Technology

• Nakagawa Tadashi

  Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria

• Matsumoto Kazuhiko

  Electrotechnical Laboratory (elt)

• Matsumoto Kazuhisa

  Sumitomo Electric Industries Ltd.

• Segawa Yusaburo

  Photodynamics Research Center Riken (institute Of Physical And Chemical Research)

• Nakagawa T

  Electrotechnical Laboratory

• Nakagawa T

  Matsushita Electric Industrial Co. Ltd. Kyoto Jpn

• Nakagawa T

  Electroinformatics Group Nanoelectronics Research Institute National Institute Of Advanced Industria

• Matsumoto K

  Advanced Industrial Science And Technology:tsukuba University:crest

• Sugiyama Yoshinobu

  Fujitsu Laboratories Ltd.

• Itatani T

  Electrotechnical Laboratory (etl)

• Itatani Taro

  Electrotechnical Laboratory

• Matsumoto Koh

  Tsukuba Laboratories Nippon Sanso Corporation

• Matsumoto K

  Electrotechnical Laboratory

• Matsumoto Kazuhiko

  Electrotechnical Laboratory

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