Effects of Mask Line-and-Space Ratio in Replicating near-0.1-μm Patterns in X-Ray Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-12-30
著者
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Nomura H
Toshiba Corp. Yokohama Jpn
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Kikuchi Y
Aset Super‐fine Sr Lithography Lab. Kanagawa Jpn
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Kikuchi Yukiko
Aset Super-fine Sr Lithography Laboratory Co Ntt Telecommnications Energy Laboratories
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Kikuchi Yukiko
Super-fine Sr Lithography Laboratory Association Of Super-advanced Electronics Technologies(aset) At
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Kikuchi Yukiko
Ulsi Research Center Toshiba Corporation
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GOMEI Yoshio
ULSI Research Center, Toshiba Corporation
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Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
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Kondo Kazuhiro
Fujitsu Laboratories Ltd.
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Kondo K
Fujitsu Laboratories Ltd.
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NOMURA Hiroshi
ULSI Research Laboratories, Toshiba Corporation
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KONDO Kenzo
ULSI Research Laboratories, Toshiba Corporation
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HIGASHIKAWA Iwao
ULSI Research Laboratories, Toshiba Corporation
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Gomei Y
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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Gomei Yoshio
Ulsi Research Center Toshiba Corporation
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Nomura H
Laboratory Of Chemistry Department Of Natural Science School Of Science And Technology Tokyo Denki U
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Higashikawa I
Ulsi Research Laboratories Toshiba Corporation
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