The Effects of HCl Added to Chemical Vapor Deposition Source Gases for Producing a SiC X-Ray Mask Membrane

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-11-30

著者

• Itoh M

  Institute Of Applied Physics University Of Tsukuba

• Itoh M

  Institute Of Industrial Science University Of Tokyo

• ITOH Masamitsu

  ULSI Research Center, Toshiba Corporation

• GOMEI Yoshio

  ULSI Research Center, Toshiba Corporation

• Itoh M

  Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

• Gomei Y

  Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn

• Gomei Yoshio

  Ulsi Research Center Toshiba Corporation

• Itoh Masamitsu

  Ulsi Research Center Toshiba Corporation

• MUROOKA Ken-ichi

  Research and Development Center, Toshiba Corporation

• KOMANO Haruki

  Research and Development Center, Toshiba Corporation

• MUROOKA Ken-ichi

  ULSI research Center, Toshiba Corporation

• KOMANO Haruki

  ULSI Research Center, Toshiba Corporation

• Komano Haruki

  Research And Development Center Toshiba Corporation

• Komano Haruki

  Ulsi Research Center Toshiba Corp

• Murooka K

  Toshiba Corp. Kawasaki Jpn

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