Fabrication of an ultra Low Stress Tungsten Absorber for X-Ray Masks : Lithography Technology

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-12-30

著者

• ITOH Masamitsu

  ULSI Research Center, Toshiba Corporation

• Hori Masaru

  Ulsi Research Center Toshiba Corporation

• NADAHARA Soichi

  ULSI Research Center, Toshiba Corporation

• MORI Ichiro

  ULSI Research Center, Toshiba Corporation

• Itoh Masamitsu

  Ulsi Research Center Toshiba Corporation

• Nadahara Soichi

  Ulsi Research Center Toshiba Corporation

• Mori Ichiro

  Ulsi Research Center Toshiba Corporation

関連論文

• Microfabrication of X-Ray Absorber W Utilizing Al_2O_3 as an Etching Mask
• Fabrication of an ultra Low Stress Tungsten Absorber for X-Ray Masks : Lithography Technology
• Prebake Effects in Chemical Amplification Electron-Beam Resist : Resist and Processes
• Prebake Effects in Chemical Amplification Electron-Beam Resist
• The Effects of HCl Added to Chemical Vapor Deposition Source Gases for Producing a SiC X-Ray Mask Membrane
• Estimation of the Density and Roughness of Thin Monolayer Films by Soft X-Ray Reflectivity Measurements

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