Magnetic Neutral Loop Discharge (NLD) Plasma and Application to SiO_2 Etching Process

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-07-30

著者

• 林 卓

  Department Of Materials Science Shonan Institute Of Technology

• Uchida T

  Institute For Semiconductor Technologies Ulvac Inc.

• Uchida Tajiro

  Institute For Semiconductor Technologies Ulvac Inc.

• Itoh M

  Institute Of Applied Physics University Of Tsukuba

• Itoh M

  Institute Of Industrial Science University Of Tokyo

• Chen W

  Mcgill Univ. Pq Can

• Chen W

  Welding Research Institute Osaka University

• Uchida T

  Mitsubishi Electric Corp. Hyogo Jpn

• Hayashi T

  Research Laboratory Oki Electric Industry Co. Ltd.

• Itoh M

  Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

• Hayashi T

  Nisshin Electric Co.

• Hayashi Tsukasa

  R D Division Nissin Electric Co. Ltd.

• Hayashi Takahisa

  Vlsi Research & Development Center Oki Electric Industry Co Ltd.

• Hayashi Takafumi

  Department Of Applied Physics Faculty Of Engineering The University Of Tokyo

• Hayashi Toshiyuki

  Department Of Mechanical Engineering Nagoya University

• Hayashi Takayoshi

  Advanced Research Institute For Science And Engineering Waseda University

• Hayashi Takayoshi

  Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation

• 林 卓

  マテリアル工学科

• Uchida Tatsuo

  Tohoku University

• Morikawa Y

  Institute For Semiconductor Technologies Ulvac Inc.

• Chen Wei

  UVLAC Japan Ltd.

• Hayashi Toshio

  UVLAC Japan Ltd.

• Itoh Masahiro

  UVLAC Japan Ltd.

• Morikawa Yasuhiro

  UVLAC Japan Ltd.

• Sugita Kippei

  Tokai University

• Sindo Haruo

  Tokai University

• Uchida Taijiro

  UVLAC Japan Ltd.

• HAYASHI Teru

  Research Laboratory of Precision Machinery and Electronics,Tokyo Institute of Technology

• Chen Wei

  The Department Of Electrical And Computer Engineering Nagoya Institute Of Technology

• Chen Wei

  Department of Electrical and Computer Engineering, Nagoya Institute Technology

• Chen Wei

  Department of Electrical and Computer Engineering, Nagoya Institute of Technology

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