Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash Electrically Erasable and Programmable ROMs
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-28
著者
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林 卓
Department Of Materials Science Shonan Institute Of Technology
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Ohno Morifumi
National Institute of Advanced Industrial Science and Technology
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FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Hayashi Takafumi
Department Of Applied Physics Faculty Of Engineering The University Of Tokyo
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Hayashi Takayoshi
Advanced Research Institute For Science And Engineering Waseda University
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大野 守史
沖セミコンダクター(株)
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Fukuda H
Ntt Microsystem Integration Laboratories
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Ohno Morifumi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Uchiyama Akira
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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HAYASHI Takahisa
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Arakawa Tomiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Matsumoto Ryoichi
LSI Process Technology Division, Oki Electric Industry Co., Ltd.
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.:(present Address)department Of El
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Arakawa Tomiyuki
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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大野 守史
静岡大学電子工学研究所
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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Matsumoto Ryoichi
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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大野 守史
(株) ソルテック
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