Novel Single-Step Rapid Thermal Oxynitridation Technology for Forming Highly Reliable Electrically Erasable Programmable Read-Only Memory Tunnel Oxide Films
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-01-30
著者
-
Yasuda Makoto
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
-
YASUDA Masaaki
Department of Bioscience and Biotechnology, Faculty of Agriculture, University of the Ryukyus
-
FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
-
Fukuda H
Hitachi Ltd. Kokubunji Jpn
-
IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
-
Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
-
Yasuda M
Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of The Ryukyus
-
Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
-
IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
関連論文
- Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography : Lithography Technology
- Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography
- A Novel Fermented Food Product Prepared from Soybean Protein-Calcium-Gel with Monascus Fungus : Changes in Protein and Nitrogen Compounds during Fermentation
- Effect of Deuterium Anneal on SiO_2/Si(100) Interface Traps and Electron Spin Resonance Signals of Ultrathin SiO_2 Films
- Absorption Coefficient and Sensitivity of Positive and Negative Resists in the Vacuum Ultraviolet Region
- Long Ni Cantilever Fabrication with New Sacrificial Process
- A Monte Carlo Study of Magnetic Domain Images in a Spin-Polarized Scanning Electron Microscope
- Fabrication of a New Electrostatic Linear Actuator
- In Situ Measurements of the Resist Etch Rate for Submicron Patterns
- Resist Etching with Parellel-Plate RF Plasmas Enhanced by a Cusp Magnetic Field
- Structural and Electrical Properties of Crystalline TiO_2 Thin Films Formed by Metalorgarnic Decomposition
- Structure Control of Ferroelectric Pb(Zr, Ti)O_3 Films Using SrTiO_3 Buffer Layer Prepared by Metalorganic Decomposition
- Interaction of Porous Pt-SnO_2 Gate Metal-Oxide-Semiconductor Field-Effect Transistor Device with CO
- Highly Sensitive MOSFET Gas Sensors with Porous Pt-SnO_x Gate Electrode for CO Sensing Applications
- Structural and Electrical Properties of Crystalline CeO_2 Films Formed by Metalorganic Decomposition
- Highly Sensitive MOSFET Gas Sensors with Porous Platinum Gate Electrode
- Highly Sensitive MOSFET Gas Sensors with Porous Platinum Gate Electrode
- Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
- Growth Kinetics of Ultrathin Silicon Dioxide Films Formed by Rapid Thermal Oxidation
- Novel Single-Step Rapid Thermal Oxynitridation Technology for Forming Highly Reliable Electrically Erasable Programmable Read-Only Memory Tunnel Oxide Films
- Kinetics of Rapid Thermal Oxidation of Silicon
- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks : Photolithography
- Role of SiN Bond Formed by N_2O-Oxynitridation for Improving Dielectric Properties of Ultrathin SiO_2 Films
- Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
- Novel Process for Direct Delineation of Spin on Glass (SOG)
- The Production of Recombinant APRP, an Alkaline Protease Derived from Bacillus pumilus TYO-67, by In Vitro Refolding of Pro-enzyme Fixed on a Solid Surface
- Wear Reduction Method for Frictionally Fast Feeding Piezoactuator
- Effect of Annealing Method to Crystalize on Sr_Bi_Ta_2O_ Thin Film Properties Formed from Alkoxide Solution
- Orientation Control of Sr_Bi_Ta_2O_ Thin Films by Chemical Liquid Deposition
- Crystallization of Sr_Bi_Ta_O_ Thin Films by Chemical Liquid Deposition
- Orientation Control of Sr_Bi_Ta_2O_9 Thin Films by Chemical Process
- Fabrication of Tungsten-Carbon Multilayers for Soft X-Ray Optics Using Excimer-Laser-Induced Chemical Vapor Deposition Technique
- Thickness Control of Multilayer Films in Laser-Induced Chemical Vapor Deposition
- Magnetron Sputter-Deposited A1_2O_3/SiO_2 Multilayer Coatings for Kilowatt Excimer Lasers with High Repetition Rates
- Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films
- Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp : Lithography Technology
- Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp
- Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
- 5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs
- The Dielectric Reliability of Very Thin SiO_2 Films Grown by Rapid Thermal Processing : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
- Analysis of the Spin Polarization of Secondary Electrons Emitted from Permalloy Polycrystals
- A Simulation of Electron Scattering in Magnetic Materials
- Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash Electrically Erasable and Programmable ROMs
- Highly Reliable Thin Nitrided SiO_2 Films Formed by Rapid Thermal Processing in an N_2O Ambient
- Antihypertensive and Hypocholesterolemic Effects of Tofuyo in Spontaneously Hypertensive Rats
- Purification and Properties of a Ribonuclease from a Species of the Genus Monascus
- A Comparative Study of High-Field Endurance for NH_3Nitrided and N_2O-Oxynitrided Ultrathin SiO_2 Films (Special Issue on Sub-Half Micron Si Device and Process Technologies)