IWABUCHI Toshiyuki | Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
スポンサーリンク
概要
関連著者
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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Fukuda H
Hitachi Ltd. Kokubunji Jpn
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.:(present Address)department Of El
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Ohno Shinji
Department Of Chemical Engineering & Technology Faculty Of Engineering Kyushu University
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Yasuda Makoto
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno S
Semiconductor Tech. Lab. Oki Electric Industry Co. Lid.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co .ltd.
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YASUDA Masaaki
Department of Bioscience and Biotechnology, Faculty of Agriculture, University of the Ryukyus
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Yasuda M
Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of The Ryukyus
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Uchiyama Akira
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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UCHIYAMA Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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HAYASHI Takahisa
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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林 卓
Department Of Materials Science Shonan Institute Of Technology
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Tanaka Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Fukuda H
Ntt Microsystem Integration Laboratories
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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YAMAJI Tetuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Yamaji Tetuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
著作論文
- Novel Single-Step Rapid Thermal Oxynitridation Technology for Forming Highly Reliable Electrically Erasable Programmable Read-Only Memory Tunnel Oxide Films
- Kinetics of Rapid Thermal Oxidation of Silicon
- Role of SiN Bond Formed by N_2O-Oxynitridation for Improving Dielectric Properties of Ultrathin SiO_2 Films
- Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
- 5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs
- The Dielectric Reliability of Very Thin SiO_2 Films Grown by Rapid Thermal Processing : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)