UCHIYAMA Akira | Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
スポンサーリンク
概要
関連著者
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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Uchiyama Akira
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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UCHIYAMA Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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HAYASHI Takahisa
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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林 卓
Department Of Materials Science Shonan Institute Of Technology
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Ohno Shinji
Department Of Chemical Engineering & Technology Faculty Of Engineering Kyushu University
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Ohno S
Semiconductor Tech. Lab. Oki Electric Industry Co. Lid.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co .ltd.
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Tanaka Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Fukuda H
Ntt Microsystem Integration Laboratories
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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YAMAJI Tetuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Yamaji Tetuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.:(present Address)department Of El
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
著作論文
- Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
- 5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs