Iwabuchi Toshiyuki | Research And Development Group Oki Electric Industry Co. Ltd.
スポンサーリンク
概要
関連著者
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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MUTOH Katsuhiko
Matsushita Research Institute Tokyo, Inc.
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MIYATA Takeo
Matsushita Research Institute Tokyo, Inc.
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Miyata Takeo
Matsushita Research Institute Tokyo Inc.
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Miyata Takeo
Electron Device System Laboratory Kanazawa Institute Of Technology
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Mutoh K
Matsushita Research Institute Tokyo Inc.
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Mutoh Katsuhiko
Matsushita Research Institute Tokyo Inc.
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IWABUCHI Takashi
Matsushita Research Institute Tokyo, Inc.
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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IWABUCHI Toshiyuki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Kudo K
Tokyo Inst. Technol. Tokyo Jpn
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Kudo K
Research Laboratory Of Resources Utilization Tokyo Institute Of Technology
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KUDO Kazuhiro
Faculty of Engineering, Chiba University
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Kudo Kazuki
Ntt Interdisciplinary Research Laboratories
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FUKUDA Hisashi
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Kudo Kazuhiro
Faculty Of Engineering Chiba University
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Kudo K
Tohoku Univ. Sendai Jpn
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Lid.
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SANO Reiji
Matsushita Research Institute Tokyo, Inc.
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Yamada Yuh
National Research Institute For Metals
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Fukuda H
Hitachi Ltd. Kokubunji Jpn
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Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
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Sano Reiji
Matsushita Research Institute Tokyou Inc
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Sano Reiji
Matsushita Research Institute Tokyo Inc.
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YAMADA Yuka
Matsushita Research Institute Tokyo, Inc.
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Fukuda Hisashi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.:(present Address)department Of El
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Yamada Yuka
Matsushita Research Institute Tokyo Inc.
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Ohno Shinji
Department Of Chemical Engineering & Technology Faculty Of Engineering Kyushu University
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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Yasuda Makoto
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno S
Semiconductor Tech. Lab. Oki Electric Industry Co. Lid.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co .ltd.
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YASUDA Masaaki
Department of Bioscience and Biotechnology, Faculty of Agriculture, University of the Ryukyus
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Osaka Tetsuya
Faculty Of Science And Engineering Waseda University
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Koiwa Ichiro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Mita Juro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Saitama Univ. Urawa‐shi Jpn
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KANEHARA Takao
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
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IWABUCHI Toshiyuki
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
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Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Institute Of Industrial Science University Of Tokyo
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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Yasuda M
Department Of Bioscience And Biotechnology Faculty Of Agriculture University Of The Ryukyus
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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TANAKA Kuniaki
Faculty of Engineering, Chiba University
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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TODOKORO Yoshihiro
Kyoto Research Lab., Matsushita Electronics Corp.
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Uchiyama Akira
Lsi Process Technology Division Oki Electric Industry Co. Ltd.
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WATANABE Hisashi
Kyoto Research Laboratory, Matsushita Electronics Co
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UCHIYAMA Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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HAYASHI Takahisa
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Todokoro Y
Kyoto Research Laboratory Matsushita Electronics Corporation
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Todokoro Yoshihiro
Kyoto Research Lab. Matsushita Electronics Corporation
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Tanaka Kuniaki
Faculty Of Engineering Chiba Unviversity
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林 卓
Department Of Materials Science Shonan Institute Of Technology
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TOMIKI Tetsuhiko
Department of Physics, Tohoku University
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Yokoyama Y
Inst. For Materials Res. Tohoku Univ.
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Sakai Hirofumi
Electrotechnical Laboratory
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Yoshida Y
Department Of Energy Engineering And Science Nagoya University
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Tanaka Akira
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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MITA Juro
Research Laboratory, Oki Electric Industry Co., Ltd.
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Maeda Masakatsu
Faculty Of Science And Engineering Waseda University
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MIYAZAKI Kenzo
Electrotechnical Laboratory
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Tomiki Tetsuhiko
Department Of Physics Faculty Of Science University Of The Ryukyus
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Fukuda H
Ntt Microsystem Integration Laboratories
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Tani Kouichi
Research And Development Group Oki Electric Industry Co. Ltd.
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KOIWA Ichiro
Research and Development Group, Oki Electric Industry Co., Ltd.
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ONO Sachiko
Faculty of Science and Engineering, Waseda University
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FURUYA Nobuaki
Matsushita Research Institute Tokyo, Inc.
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IWABCHI Takashi
Matsushita Research Institute Tokyou, Inc
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YAMAJI Tetuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Yamaji Tetuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Furuya Nobuaki
Matsushita Research Institute Tokyo Inc.
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Furuya N
Matsushita Research Institute Tokyo Inc.
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Yokoyama Yoshihiko
Superconductivity Research Laboratory, International Superconductivity Technology Center
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Tani Kouichi
Research and Development Center, Ricoh Company Ltd.
著作論文
- Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography : Lithography Technology
- Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography
- Absorption Coefficient and Sensitivity of Positive and Negative Resists in the Vacuum Ultraviolet Region
- Novel Single-Step Rapid Thermal Oxynitridation Technology for Forming Highly Reliable Electrically Erasable Programmable Read-Only Memory Tunnel Oxide Films
- Kinetics of Rapid Thermal Oxidation of Silicon
- Role of SiN Bond Formed by N_2O-Oxynitridation for Improving Dielectric Properties of Ultrathin SiO_2 Films
- Wear Reduction Method for Frictionally Fast Feeding Piezoactuator
- Effect of Annealing Method to Crystalize on Sr_Bi_Ta_2O_ Thin Film Properties Formed from Alkoxide Solution
- Orientation Control of Sr_Bi_Ta_2O_ Thin Films by Chemical Liquid Deposition
- Crystallization of Sr_Bi_Ta_O_ Thin Films by Chemical Liquid Deposition
- Orientation Control of Sr_Bi_Ta_2O_9 Thin Films by Chemical Process
- Fabrication of Tungsten-Carbon Multilayers for Soft X-Ray Optics Using Excimer-Laser-Induced Chemical Vapor Deposition Technique
- Thickness Control of Multilayer Films in Laser-Induced Chemical Vapor Deposition
- Magnetron Sputter-Deposited A1_2O_3/SiO_2 Multilayer Coatings for Kilowatt Excimer Lasers with High Repetition Rates
- Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films
- Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp : Lithography Technology
- Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp
- Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
- 5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs
- The Dielectric Reliability of Very Thin SiO_2 Films Grown by Rapid Thermal Processing : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)