Yamada Yuka | Matsushita Research Institute Tokyo Inc.
スポンサーリンク
概要
関連著者
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Yamada Yuka
Matsushita Research Institute Tokyo Inc.
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YAMADA Yuka
Matsushita Research Institute Tokyo, Inc.
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IWABUCHI Takashi
Matsushita Research Institute Tokyo, Inc.
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MUTOH Katsuhiko
Matsushita Research Institute Tokyo, Inc.
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MIYATA Takeo
Matsushita Research Institute Tokyo, Inc.
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Yamada Yuh
National Research Institute For Metals
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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Miyata Takeo
Matsushita Research Institute Tokyo Inc.
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Miyata Takeo
Electron Device System Laboratory Kanazawa Institute Of Technology
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Mutoh K
Matsushita Research Institute Tokyo Inc.
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Mutoh Katsuhiko
Matsushita Research Institute Tokyo Inc.
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Takeyama Shigeru
Matsushita Research Institute Tokyo Inc.
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Orii Takaaki
Institute Of Applied Physics University Of Tsukuba
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Yoshida Takehito
Matsushita Research Institute Tokyo Inc.
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Yokoyama Y
Inst. For Materials Res. Tohoku Univ.
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Yoshida Y
Department Of Energy Engineering And Science Nagoya University
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Yamada Y
Fuji Electric Co. Ltd. Nagano Jpn
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FURUYA Nobuaki
Matsushita Research Institute Tokyo, Inc.
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Furuya Nobuaki
Matsushita Research Institute Tokyo Inc.
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Furuya N
Matsushita Research Institute Tokyo Inc.
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ORII Takaaki
Institute of Applied Physics, University of Tsukuba
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TAKEYAMA Shigeru
Matsushita Research Institute Tokyo, Inc.
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YOSHIDA Takehito
Matsushita Research Institute Tokyo, Inc.
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Yoshida T
Tokin Co. Kanagawa Jpn
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Umezu Ikurou
Faculty Of Industrial Science And Technology Science University Of Tokyo
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Yokoyama Yoshihiko
Superconductivity Research Laboratory, International Superconductivity Technology Center
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Umezu Ikurou
Faculty of Industrial Science and Technology, Science University of Tokyo, Noda, Chiba 278, Japan
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Yoshida Takehito
Matsushita Research Institute Tokyo, Inc., 3-10-1 Higashimita, Tama-ku, Kawasaki 214, Japan
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Orii Takaaki
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305, Japan
著作論文
- Fabrication of Tungsten-Carbon Multilayers for Soft X-Ray Optics Using Excimer-Laser-Induced Chemical Vapor Deposition Technique
- Thickness Control of Multilayer Films in Laser-Induced Chemical Vapor Deposition
- Magnetron Sputter-Deposited A1_2O_3/SiO_2 Multilayer Coatings for Kilowatt Excimer Lasers with High Repetition Rates
- Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films
- Nanometer-Sized Silicon Crystallites Prepared by Excimer Laser Ablation in Constant Pressure Inert Gas Ambient
- Optical Properties of Silicon Nanocrystallites Prepared by Excimer Laser Ablation in Inert Gas