YAMADA Yuka | Matsushita Research Institute Tokyo, Inc.
スポンサーリンク
概要
関連著者
-
YAMADA Yuka
Matsushita Research Institute Tokyo, Inc.
-
Yamada Yuka
Matsushita Research Institute Tokyo Inc.
-
IWABUCHI Takashi
Matsushita Research Institute Tokyo, Inc.
-
MUTOH Katsuhiko
Matsushita Research Institute Tokyo, Inc.
-
MIYATA Takeo
Matsushita Research Institute Tokyo, Inc.
-
Yamada Yuh
National Research Institute For Metals
-
Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
-
Miyata Takeo
Matsushita Research Institute Tokyo Inc.
-
Miyata Takeo
Electron Device System Laboratory Kanazawa Institute Of Technology
-
Mutoh K
Matsushita Research Institute Tokyo Inc.
-
Mutoh Katsuhiko
Matsushita Research Institute Tokyo Inc.
-
Yamada Y
Fuji Electric Co. Ltd. Nagano Jpn
-
ORII Takaaki
Institute of Applied Physics, University of Tsukuba
-
TAKEYAMA Shigeru
Matsushita Research Institute Tokyo, Inc.
-
YOSHIDA Takehito
Matsushita Research Institute Tokyo, Inc.
-
Yokoyama Y
Inst. For Materials Res. Tohoku Univ.
-
Yoshida Y
Department Of Energy Engineering And Science Nagoya University
-
FURUYA Nobuaki
Matsushita Research Institute Tokyo, Inc.
-
Furuya Nobuaki
Matsushita Research Institute Tokyo Inc.
-
Furuya N
Matsushita Research Institute Tokyo Inc.
-
UMEZU Ikurou
Faculty of Industrial Science and Technology, Science University of Tokyo
-
Yoshida T
Tokin Co. Kanagawa Jpn
-
Takeyama Shigeru
Matsushita Research Institute Tokyo Inc.
-
Orii Takaaki
Institute Of Applied Physics University Of Tsukuba
-
Yoshida Takehito
Matsushita Research Institute Tokyo Inc.
-
Yokoyama Yoshihiko
Superconductivity Research Laboratory, International Superconductivity Technology Center
著作論文
- Fabrication of Tungsten-Carbon Multilayers for Soft X-Ray Optics Using Excimer-Laser-Induced Chemical Vapor Deposition Technique
- Thickness Control of Multilayer Films in Laser-Induced Chemical Vapor Deposition
- Magnetron Sputter-Deposited A1_2O_3/SiO_2 Multilayer Coatings for Kilowatt Excimer Lasers with High Repetition Rates
- Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films
- Optical Properties of Silicon Nanocrystallites Prepared by Excimer Laser Ablation in Inert Gas
- Nanometer-Sized Silicon Crystallites Prepared by Excimer Laser Ablation in Constant Pressure Inert Gas Ambient