Ono S | Institute Of Industrial Science University Of Tokyo
スポンサーリンク
概要
関連著者
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Ono S
Saitama Univ. Urawa‐shi Jpn
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Ono S
Institute Of Industrial Science University Of Tokyo
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Sakakibara A
Department Of Mechanical Engineering Okayama University
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Osaka Tetsuya
Faculty Of Science And Engineering Waseda University
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Koiwa Ichiro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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Mita Juro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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KANEHARA Takao
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
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IWABUCHI Toshiyuki
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
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Koiwa Ichiro
The Authors Are With Research And Development Group Oki Electric Industry Co. Ltd.
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Seki T
Tokyo Inst. Of Technol. Yokohama‐shi Jpn
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OSAKA Tetsuya
The authors are with the School of Science and Engineering, Waseda University
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ONO Sachiko
The authors are with Advanced Research Institute for Science and Engineering, Waseda University
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SAKAKIBARA Akira
The authors are with the School of Science and Engineering, Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
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Hashimoto A
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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Hashimoto Akihiro
Optoelectronics Technology Research Laboratory
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Asami Katsuhiko
Institute For Materials Research Tohoku University
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Maeda Masakatsu
Faculty Of Science And Engineering Waseda University
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Hashimoto A
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
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Kato Haruo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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KOIWA Ichiro
Research and Development Group, Oki Electric Industry Co., Ltd.
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ONO Sachiko
Faculty of Science and Engineering, Waseda University
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Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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HASHIMOTO Akira
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
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KATO Hiroyo
Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.
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SAKAKIBARA Akira
School of Science and Engineering, Waseda University
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OSAKA Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University, School of Science and En
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KANEHARA Takao
The authors are with Microsystems Technology Laboratory, Oki Electric Industry Co., Ltd.
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MITA Juro
The authors are with Microsystems Technology Laboratory, Oki Electric Industry Co., Ltd.
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SEKI Tomonori
The authors are with the School of Science and Engineering, Waseda University
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SAKAKIBARA Akira
Department of Applied Chemistry, Kagami Memorial Laboratory for Material Science and Technology, Was
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SEKI Tomonori
Department of Applied Chemistry, Kagami Memorial Laboratory for Material Science and Technology, Was
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Asami Katsuhiko
Institute For Material Research Tohoku University
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Kato Hiroyo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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OSAKA Tetsuya
Advanced Research Institute for Science & Engineering
著作論文
- Orientation Control of Sr_Bi_Ta_2O_ Thin Films by Chemical Liquid Deposition
- Crystallization of Sr_Bi_Ta_O_ Thin Films by Chemical Liquid Deposition
- Orientation Control of Sr_Bi_Ta_2O_9 Thin Films by Chemical Process
- Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_Bi_Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
- Crystallization Process of Sr_Bi_Ta_2O_9 Thin Films with Different Crystal Orientation Prepared by Chemical Liquid Deposition Using Alkoxide Precursor(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Structural Defects in Sr_Bi_Ta_2O_9 Thin Film for Ferroelectric Memory(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Phase Transition in Ferroelectric SrBi_2Ta_2O_9) Thin Films with Change of Heat-treatment Temperature