Koiwa Ichiro | Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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概要
- Koiwa Ichiroの詳細を見る
- 同名の論文著者
- Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japanの論文著者
関連著者
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Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Asami Katsuhiko
Institute For Material Research Tohoku University
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Kato Hiroyo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
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Kato Haruo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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KATO Hiroyo
Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.
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SAKAKIBARA Akira
School of Science and Engineering, Waseda University
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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OSAKA Tetsuya
Advanced Research Institute for Science & Engineering
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浅見 勝彦
東北大学金属材料研究所
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浅見 勝彦
東北大・金研
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Kawashima A
Tohoku Univ. Ibaraki Jpn
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Osaka Tetsuya
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Hashimoto A
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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Hashimoto Akihiro
Optoelectronics Technology Research Laboratory
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Asami Katsuhiko
Institute For Materials Research Tohoku University
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Koiwa Ichiro
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Hashimoto A
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
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Ono S
Saitama Univ. Urawa‐shi Jpn
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Sano Kazuya
Yokohama Plant Japan Steel Works Ltd.
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YAMANOBE Tomomi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Yamanobe Tomomi
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Institute Of Industrial Science University Of Tokyo
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YOSHIE Tomohisa
Department of Applied ChemiStry, School of Science and Engineering, Waseda University
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HOSHIKA Takeshi
Department of Applied ChemiStry, School of Science and Engineering, Waseda University
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SAWADA Yoshihiro
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
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HASHIMOTO Akira
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
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OSAKA Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University, School of Science and En
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Sawada Y
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
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Hoshika Takeshi
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Yoshie Tomohisa
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Sakakibara A
Department Of Mechanical Engineering Okayama University
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Takaya Koji
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Takaya Koji
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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Kanehara Takao
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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Ashikaga Kinya
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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Koiwa Ichiro
Semiconductor Technology Laboratory, Research and Development Group,
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Kato Hiroyo
Semiconductor Technology Laboratory, Research and Development Group,
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Kanehara Takao
Semiconductor Technology Laboratory, Research and Development Group,
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Osaka Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University,
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Sakakibara Akira
School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan
著作論文
- Effects of Ion Etching and Annealing in O_2 Atmosphere Following Ion Etching on Properties and Chemistry of Sr_Bi_Ta_2O_ Thin Films
- Control of Crystal Orientation of Ferroelectric SrBi_2Ta_2O_9 Thin Films with Multi-Seeding Layers
- Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_Bi_Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
- Low Voltage Operation of Ferroelectric Sr_Bi_Ta_2O_9 Thin Films Crystallized by Excimer Laser Annealing
- Dependences of Process-Induced Damage on Imprint Characteristics in SrBi2Ta2O9 Capacitors
- Effects of H2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr0.9Bi2.1Ta2O9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method