Osaka T | Graduate School Of Science And Engineering Waseda University
スポンサーリンク
概要
関連著者
-
Osaka T
Graduate School Of Science And Engineering Waseda University
-
Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
-
Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
-
Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
-
Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
-
Asahi Toru
Graduate School Of Science And Engineering Waseda University
-
Asahi T
Graduate School Of Science And Engineering Waseda University
-
Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
-
Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
-
Asahi Toru
Waseda Univ.
-
Osaka Tetsuya
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Sayama Junichi
Graduate School Of Science And Engineering Waseda University
-
Asahi Toru
Institute For Biomedical Engineering Waseda University
-
Ono S
Saitama Univ. Urawa‐shi Jpn
-
Ono S
Institute Of Industrial Science University Of Tokyo
-
Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
-
Kawaji Jun
Graduate School Of Science & Engineering Waseda University
-
Osaka T
Faculty Of Science And Engineering Waseda University
-
Homma Takayuki
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
-
Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
-
Osaka T.
Faculty of Science and Engineering, Waseda University
-
Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
-
Sakakibara A
Department Of Mechanical Engineering Okayama University
-
Homma T
Shibaura Inst. Technol. Tokyo Jpn
-
Osaka Tetsuya
Faculty Of Science And Engineering Waseda University
-
Homma T
Univ. Tokyo Tokyo Jpn
-
Koiwa Ichiro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
-
Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
-
Mita Juro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
-
KANEHARA Takao
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
-
IWABUCHI Toshiyuki
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
-
本間 敬之
早稲田大学先進理工学部
-
INOUE TOMOYUKI
Department of Bioengineering, Tokyo Institute of Technology
-
NIWA Daisuke
Institute for Biomedical Engineering, Waseda University
-
FUKUNAGA Hiroshi
Major in Nano-Science and Nano-Engineering, Waseda University
-
HOMMA Takayuki
Major in Nano-Science and Nano-Engineering, Waseda University
-
Inoue T
Department Of Applied Chemistry Waseda University
-
Matsubara Hiroshi
Department of Respirology, Graduate School of Medicine, Chiba University
-
Noda K
Gunze Ltd. Shiga Jpn
-
Niwa Daisuke
Department Of Applied Chemistry Waseda University
-
Osaka Tetsuya
Graduate School Of Science And Engineering Waseda University
-
Homma Takayuki
Department Of Applied Chemistry Waseda University
-
Watanabe Teruo
Futaba Corporation
-
Yamashita Yuki
Graduate School Of Science And Engineering Waseda University
-
Watanabe T
Components Development Group Sony Corporation
-
Watanabe T
Ritsumeikan Univ. Shiga Jpn
-
Watanabe Tetsu
Components Development Group Sony Corporation
-
Miyamoto H
Hitachi Ltd. Tokyo Jpn
-
WATANABE TOSHIHIKO
Department of Surgery, Tachikawa Kyosai Hospital
-
Hashimoto A
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
-
Hashimoto Akihiro
Optoelectronics Technology Research Laboratory
-
Inoue Tomoyuki
Department Of Applied Chemistry Waseda University
-
Watanabe T
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
-
Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
-
Noda K
Japan Atomic Energy Research Inst. Ibaraki
-
Noda Kazuhiro
Department Of Electrical Engineering And Electronics Faculty Of Engineering Tottori University
-
Koiwa Ichiro
The Authors Are With Research And Development Group Oki Electric Industry Co. Ltd.
-
Noda Kazuhiro
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Takatoshi Yamada
Department Of Electrical Engineering And Electronics Aoyama-gakuin University
-
Fukunaga Hiroshi
Department Of Applied Chemistry Waseda University
-
Matsubara Hiroshi
Department Of Dermatology Graduate School Of Medicine Chiba University
-
Hashimoto A
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
-
Matsubara H
Department Of Biochemistry Faculty Of Science Okayama University Of Science
-
Matsubara H
Development Department Dainippon Screen Manufacturing Co. Ltd.
-
Seki T
Tokyo Inst. Of Technol. Yokohama‐shi Jpn
-
MITAMURA Satoshi
Department of Applied Chemistry, School of Science and Engineering, Waseda University
-
Mitamura Shigehiro
Surface Analysis Research Laboratory Shimadzu Corporation
-
KOIZUMI Isao
School of Science and Engineering, Waseda University
-
Sayama J.
Faculty of Science and Engineering, Waseda University
-
Asahi T.
Faculty of Science and Engineering, Waseda University
-
KAWAJI Jun
Waseda University
-
Sayama Junichi
School of Science and Engineering, Waseda University
-
Kawaji Jun
School of Science and Engineering, Waseda University
-
Tanaka Mutsumi
School of Science and Engineering, Waseda University
-
Asahi Toru
Advanced Research Institute for Science and Engineering, Waseda university
-
Osaka Tetsuya
School of Science and Engineering, Waseda University
-
Tanaka Mutsumi
School Of Science And Engineering Waseda University
-
HASHIMOTO Akira
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
-
OSAKA Tetsuya
The authors are with the School of Science and Engineering, Waseda University
-
ONO Sachiko
The authors are with Advanced Research Institute for Science and Engineering, Waseda University
-
SAKAKIBARA Akira
The authors are with the School of Science and Engineering, Waseda University
-
Koizumi Isao
School Of Science And Engineering Waseda University
-
Matsumoto H
Department Of Earth And Space Science Graduate School Of Science Osaka University
-
Kuroiwa Shigeki
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
-
Kuroiwa Shigeki
Institute For Biomedical Engineering Waseda University
-
Matsumura Satoshi
Development And Technology Division Hitachi Maxell Ltd
-
Hideshima Sho
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
-
Watanabe Toshihiko
Department Of Pediatric Surgery Saitama City Hospital
-
Watanabe Toshihiko
Department Of Aeronautics And Astronautics University Of Tokyo
-
Nakamura Takahiro
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
-
Matsubara Hiroshi
Deparlment Of Internal Medicine School Of Medicine Kyoto University
-
Nakanishi Takuya
Graduate School Of Advanced Science And Engineering Waseda University
-
Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
-
AKASAKA Toru
Department of Pediatrics, Medical Support Center for Children and Families
-
Fukunaga Hiroshi
Department Of Cardiology Mito-saiseikai General Hospital
-
ASAMI K.
Institute for Materials Research, Tohoku University
-
OSAKA Tetsuya
Institute for Biomedical Engineering, Waseda University
-
Osaka Tetsuya
Waseda Univ.
-
Asami K
Institute For Chemical Research Kyoto University
-
Osaka Tetsuya
Institute For Biomedical Engineering Waseda University
-
Osaka Tetsuya
Waseda Institute For Advanced Study Waseda University
-
Homma Takayuki
Waseda University
-
Watanabe T
Tokyo Inst. Technol. Kanagawa Jpn
-
YAMADA Keiko
Department of Ophthalmology, School of Medicine, Keio University
-
ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
-
YAMADA Taro
Surface Chemistry Laboratory, RIKEN
-
YAMADA Taro
Kagami Memorial Laboratory for Materials Science and Technology, Waseda University
-
TAKANO Nao
Department of Applied Chemistry, School of Science and Engineering, Waseda University
-
YOSHITOMI Shuhei
Department of Applied Chemistry, School of Science and Engineering, Waseda University
-
Watanabe T
Reserch And Development Division Toto Ltd.
-
SAKURAI Yoshihiro
Department of Chemical Engineering, Kansai University
-
Watanabe T
Tohoku Univ. Sendai Jpn
-
Asami Katsuhiko
Institute For Materials Research Tohoku University
-
Maeda Masakatsu
Faculty Of Science And Engineering Waseda University
-
Koiwa Ichiro
Department of Applied Material and Life Science, Faculty of Engineering, Kanto Gakuin University
-
Nakamura Takahiro
Department Of Allergy And Immunology National Research Institute For Child Health And Development Na
-
MIZUTANI Hirokazu
Department of Radiology, Nagoya City University, Medical School
-
Kato Haruo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
-
Takano Nao
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Takano Nao
Department Of Applied Chemistry School Of Science And Engineering Kagami Memorial Laboratory For Mat
-
Akasaka Toru
Department Of Applied Chemistry Waseda University
-
Morikawa T.
Fujitsu Laboratories Ltd.
-
Matsumoto K.
Fujitsu Laboratories Ltd.
-
KOIWA Ichiro
Research and Development Group, Oki Electric Industry Co., Ltd.
-
ONO Sachiko
Faculty of Science and Engineering, Waseda University
-
Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
-
Yamashita Y.
Faculty of Science and Engineering, Waseda University
-
Ariake J.
AIT, Akita Prefectural R&D Center
-
Ouchi K.
AIT, Akita Prefectural R&D Center
-
Agui A.
Synchrotron Radiation Research Center, Japan Atomic Energy Research Institute
-
Mizumaki M.
Japan Synchrotron Radiation Research Institute
-
Asahi T.
Major in Nano-Science and Nano-Engineering, Waseda University
-
Sayama J.
Department of Applied Chemistry, Waseda University
-
Nakatani T.
Synchrotron Radiation Research Center, Japan Atomic Energy Research Institute
-
Matsushita T.
Japan Synchrotron Radiation Research Institute
-
Osaka T.
Department of Applied Chemistry, Waseda University
-
Miura Y.
Shinshu University
-
SAYAMA Junichi
Waseda University
-
Matsumura Satoshi
Development and Technology Division, Hitachi Maxell, Ltd
-
MATSUNUMA Satoshi
Development and Technology Division, Hitachi Maxell, Ltd.
-
Ariake J.
Ait Akita Prefectural R&d Center
-
Kawaji J
Graduate School Of Science & Engineering Waseda University
-
Mizutani Hirokazu
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
USUDA Masahiko
Department of Applied Chemistry, Science and Engineering, Waseda University
-
SAWAI Hideo
Research Labs., OKI Electric Industry Co. Ltd.
-
Kawaji J.
Graduate School of Science & Engineering, Waseda University
-
Hashimoto H.
Graduate School of Science & Engineering, Waseda University
-
Asahi T.
Graduate School of Science & Engineering, Waseda University
-
Hokkyo J.
Advanced Research Institute for Science & Engineering, Waseda University
-
Osaka T.
Graduate School of Science & Engineering, Waseda University
-
Kawaji J
School of Science & Engineering, Waseda University
-
Asahi T
Advanced Research Institute for Science & Engineering, Waseda University
-
Hashimoto H
School of Science & Engineering, Waseda University
-
Osaka T
School of Science & Engineering, Waseda University
-
KAWAJI J.
School of Science & Engineering, Waseda University
-
ASAHI T.
Advanced Research Institute for Science & Engineering, Waseda University
-
HASHIMOTO H.
School of Science & Engineering, Waseda University
-
OSAKA T.
School of Science & Engineering, Waseda University
-
YOSHIE Tomohisa
Department of Applied ChemiStry, School of Science and Engineering, Waseda University
-
HOSHIKA Takeshi
Department of Applied ChemiStry, School of Science and Engineering, Waseda University
-
SAWADA Yoshihiro
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
-
KATO Hiroyo
Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.
-
SAKAKIBARA Akira
School of Science and Engineering, Waseda University
-
OSAKA Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University, School of Science and En
-
KANEHARA Takao
The authors are with Microsystems Technology Laboratory, Oki Electric Industry Co., Ltd.
-
MITA Juro
The authors are with Microsystems Technology Laboratory, Oki Electric Industry Co., Ltd.
-
SEKI Tomonori
The authors are with the School of Science and Engineering, Waseda University
-
SAKAKIBARA Akira
Department of Applied Chemistry, Kagami Memorial Laboratory for Material Science and Technology, Was
-
SEKI Tomonori
Department of Applied Chemistry, Kagami Memorial Laboratory for Material Science and Technology, Was
-
KUROKAWA Yoshiaki
Department of Applied Chemistry, School of Science and Engineering, Waseda University
-
Hokkyo J.
Advanced Research Institute For Science & Engineering Waseda University
-
Sawai Hideo
Research Labs. Oki Electric Industry Co. Ltd.
-
Usuda Masahiko
Department Of Applied Chemistry Science And Engineering Waseda University
-
Asami Katsuhiko
Institute For Material Research Tohoku University
-
Sawada Y
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
-
Hoshika Takeshi
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Yoshie Tomohisa
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Kato Hiroyo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
-
Kurokawa Yoshiaki
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Yoshitomi Shuhei
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Yamada Keiko
Department Of Anatomy Hokkaido University School Of Medicine
-
HIDESHIMA Sho
Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University
-
Sakurai Yoshihiro
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
-
Agui A.
Synchrotron Radiation Research Center Japan Atomic Energy Research Institute
-
Yamamoto Daisuke
Graduate School Of Medical Sciences Kyushu University
-
Yamada Keiko
Department Of Anaomy Hokkaido University School Of Medicine
-
Yamada Keiko
Department Of Applied Chemistry School Of Science And Engineering Waseda University
-
Nakatani T.
Synchrotron Radiation Research Center Japan Atomic Energy Research Institute
-
Asami K
Institute For Material Research Tohoku University
-
Asami K.
Institute For Material Research Tohoku University
-
Kuroiwa Shigeki
Graduate School Of Advanced Science And Engineering Waseda University
-
Homma Takayuki
Waseda Univ. Tokyo Jpn
-
Kawaji J.
Graduate School Of Science & Engineering Waseda University
-
HIDESHIMA Sho
Research Institute for Science and Engineering, Faculty of Science and Engineering, Waseda University
-
Yamamoto Daisuke
Graduate School Of Advanced Science And Engineering Waseda University
-
Hideshima Sho
Research Institute For Science And Engineering Faculty Of Science And Engineering Waseda University
-
Ariake J.
AIT, Akita Prefectural R&D Center
-
OSAKA Tetsuya
Advanced Research Institute for Science & Engineering
著作論文
- Surface Conductivity in Methyl-monolayer/Si Heterojunction Structure in the Presence of Water
- Electrochemical Behavior of Methyl- and Butyl- Terminated Si(111) in Aqueous Solution
- Evaluation of Organic Monolayers Formed on Si(111) : Exploring the Possibilities for Application in Electron Beam Nanoscale Patterning : Semiconductors
- Microstructural Study of Electroless-Plated CoNiReP/NiMoP Double-Layered Media for Perpendicular Magnetic Recording
- Recording Characteristics of Electroless-Plated CoNiReP Films with an In-Plane Anisotropic Initial Layer : Magnetism, Magnetic Materials and Devices
- Orientation Control of Sr_Bi_Ta_2O_ Thin Films by Chemical Liquid Deposition
- Crystallization of Sr_Bi_Ta_O_ Thin Films by Chemical Liquid Deposition
- Orientation Control of Sr_Bi_Ta_2O_9 Thin Films by Chemical Process
- Fabrication of SmCo_5 double-layered recording media with high perpendicular magnetic anisotropy
- Fabrication of SmCo_5 double-layered recording media with high perpendicular magnetic anisotropy(PMR media,The 8th Asian Symposium on Information Storage Technology (ASIST-8))
- Developing SmCo_5 perpendicular magnetization thin films for magnetic recording media(Selected papers from MORIS 2006 Workshop on Thermal & Optical Magnetic Materials and Devices)
- Magnetic Properties and Domain Structure of SmCo_5 Perpendicular Magnetization Films Prepared by Using a UHV Sputtering System
- MCD Measurement at the Tb M_-edges of Tb_Fe_xCo_ Perpendicular Magnetization Films(Magnetism and Spin Dynamics)
- Development of Perpendicular Magnetic Recording Media for High Density Recording
- Influence of Sputtering Conditions for Co/Pd Multilayer on its Magnetic Properties and Crystalline Microstructure
- Influence of Sputtering Conditions for Co/Pd Multilayer on its Magnetic Properties and Crystalline Microstructure
- Effect of Phosphorus Content of the Magnetic and Electric Properties of Electroless Ni-P Film after Heat Treatment : Magnetism, Magnetic Materials and Devices
- Optimization of the Thickness Ratio of Pd/Si Intermediate Layer in Co/Pd Multilayer Perpendicular Magnetic Recording Medium
- Effect of the Preparation Conditions of a Pd/Si Dual Seedlayer on the Magnetic Properties of Co/Pd Multilayered Perpendicular Magnetic Recording Media
- Effect of the Preparation Conditions of a Pd/Si Dual Seedlayer on the Magnetic Properties of Co/Pd Multilayered Perpendicular Magnetic Recording Media
- Control of Crystal Orientation of Ferroelectric SrBi_2Ta_2O_9 Thin Films with Multi-Seeding Layers
- Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_Bi_Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
- Crystallization Process of Sr_Bi_Ta_2O_9 Thin Films with Different Crystal Orientation Prepared by Chemical Liquid Deposition Using Alkoxide Precursor(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Structural Defects in Sr_Bi_Ta_2O_9 Thin Film for Ferroelectric Memory(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Phase Transition in Ferroelectric SrBi_2Ta_2O_9) Thin Films with Change of Heat-treatment Temperature
- Evaluation of Double-Layered Magnetic Recording Medium Composed of Perpendicular and Longitudinal Anisotropy Layers
- Perpendicular Magnetic Recording Performance with Ring-Type Heads for Electroless-Plated CoNiReP/NiFeP Double-Layered Media
- Sialylglycan-modified Field Effect Transistor for Detection of Charged Lectin under Physiological Conditions
- Detection of Matrix Metalloproteinase-2 by Field Effect Transistor with a Fibronectin-immobilized Gate