Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_<0.9>Bi_<2.1>Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-09-01
著者
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Asami Katsuhiko
Institute For Materials Research Tohoku University
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Kato Haruo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Saitama Univ. Urawa‐shi Jpn
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Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Ono S
Institute Of Industrial Science University Of Tokyo
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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KATO Hiroyo
Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.
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SAKAKIBARA Akira
School of Science and Engineering, Waseda University
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OSAKA Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University, School of Science and En
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Asami Katsuhiko
Institute For Material Research Tohoku University
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Kato Hiroyo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Sakakibara A
Department Of Mechanical Engineering Okayama University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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OSAKA Tetsuya
Advanced Research Institute for Science & Engineering
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