KATO Hiroyo | Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.

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概要

• KATO Haruoの詳細を見る
• 同名の論文著者
• Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.の論文著者

関連著者

• Kato Haruo

  Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.

• KATO Hiroyo

  Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.

• Kato Hiroyo

  Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.

• Koiwa Ichiro

  Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.

• Koiwa Ichiro

  Department Of Applied Chemistry Science And Engineering Waseda University

• Kanehara T

  Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.

• Kanehara Takao

  Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.

• Koiwa Ichiro

  Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan

• 黄 俐昭

  Necシリコンシステム研究所

• Osaka T

  Department Of Applied Chemistry School Of Science And Engineering Waseda University

• Osaka Tetsuya

  Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl

• ASAMI Katsuhiko

  Institute for Materials Research, Tohoku University

• ONO Sachiko

  Advanced Research Center of Science and Engineering, Waseda University

• Asami Katsuhiko

  Institute For Materials Research Tohoku University

• Ono S

  Saitama Univ. Urawa‐shi Jpn

• Sano Kazuya

  Yokohama Plant Japan Steel Works Ltd.

• Ono S

  Institute Of Industrial Science University Of Tokyo

• Osaka T

  Graduate School Of Science And Engineering Waseda University

• Osaka Tetsuya

  Department Of Applied Chemistry Science And Engineering Waseda University

• SAKAKIBARA Akira

  School of Science and Engineering, Waseda University

• OSAKA Tetsuya

  Advanced Research Institute for Science and Engineering, Waseda University, School of Science and En

• Asami Katsuhiko

  Institute For Material Research Tohoku University

• Ono Sachiko

  Advanced Research Center Of Science And Engineering Waseda University

• Kato Haruo

  Ulsi Device Development Laboratories Nec Corporation

• Osaka Tetsuya

  Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University

• Sakakibara A

  Department Of Mechanical Engineering Okayama University

• Koh R

  Silicon Systems Research Labs.

• Koh Risho

  Microelectronics Res. Labs. Nec Corp.

• Osaka Tetsuya

  Graduate School Of Advanced Science And Engineering Waseda University

• MATSUMOTO Hiroshi

  Microelectronics Research Laboratories, NEC Corporation

• Matsumoto Hiroshi

  Microelectronics Research Laboratories Nec Corporation

• OSAKA Tetsuya

  Advanced Research Institute for Science & Engineering

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著作論文

• Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_Bi_Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
• Low Voltage Operation of Ferroelectric Sr_Bi_Ta_2O_9 Thin Films Crystallized by Excimer Laser Annealing
• Modeling on the Channel-To-S/D Capacitance and the Short Channel Effect for 0.1μm Fully Depleted SOI-MOSFET

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