OSAKA Tetsuya | Advanced Research Institute for Science & Engineering
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概要
関連著者
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OSAKA Tetsuya
Advanced Research Institute for Science & Engineering
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Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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SAKAKIBARA Akira
School of Science and Engineering, Waseda University
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OSAKA Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University, School of Science and En
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Asami Katsuhiko
Institute For Material Research Tohoku University
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Kato Hiroyo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry School Of Science And Engineering Kagami Memorial Laboratory For Mat
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Asami Katsuhiko
Institute For Materials Research Tohoku University
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Yamauchi Yusuke
World Premier International (wpi) Research Center International Center For Materials Nanoarchitecton
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Yamauchi Yusuke
World Premier International (wpi) Research Center For Materials Nanoarchitectonics (mana) National I
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Yamauchi Yusuke
World Premier International (wpi) Research Center International Center For Materials Nanoarchitecton
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Yamauchi Yusuke
International Center For Materials Nanoarchitectonics (mana) National Institute For Materials Scienc
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Yamauchi Yusuke
Faculty Of Science And Engineering Waseda University
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Yamauchi Yusuke
Department Of Chemistry School Of Science And Engineering Waseda University
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Kuroda Kazuyuki
Graduate School Of Science And Engineering Waseda University
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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MUKAIBO Hitomi
Graduate School of Science and Engineering, Waseda University
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Kato Haruo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Saitama Univ. Urawa‐shi Jpn
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Mukaibo Hitomi
Graduate School Of Science And Engineering Waseda University
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Yamauchi Yusuke
Major In Nanoscience And Nanotechnology Waseda University
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Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Institute Of Industrial Science University Of Tokyo
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SHIGENO Tetsuro
Department of Applied Chemistry, Waseda University
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Shigeno Tetsuro
Department Of Applied Chemistry Waseda University
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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KATO Hiroyo
Semiconductor Technology Laboratory, Research and Development Group, Oki Electric Industry Co. Ltd.
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MOMMA Toshiyuki
Major in Nanoscience and Nanoengineering, Graduate School of Science and Engineering, Waseda Univers
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YOKOSHIMA Tokihiko
Advanced Research Institute for Science and Engineering, Waseda University
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MUKAIBO Hitomi
Department of Applied Chemistry, Waseda University
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TEZUKA Masato
Department of Applied Chemistry, Waseda University
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KURODA Kazuyuki
Advanced Research Institute for Science and Engineering, Waseda University
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Tezuka Masato
Department Of Applied Chemistry Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Sakakibara A
Department Of Mechanical Engineering Okayama University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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Yamauchi Yusuke
World Premier International (wpi) Research Center For Materials Nanoarchitectonics (mana) National I
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Yamauchi Yusuke
World Premier International (wpi) Research Center For Materials Nanoarchitectonics (mana) National I
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Yamauchi Yusuke
World Premier International (wpi) Research Center For Materials Nanoarchitectonics (mana) National I
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Yokoshima Tokihiko
Advanced Research Institute For Science And Engineering Waseda University
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Osaka T
Research Institute For Science And Engineering Waseda University
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門間 聰之
Research Institute For Science And Engineering Waseda University
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Koiwa Ichiro
Semiconductor Technology Laboratory, Research and Development Group,
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Kato Hiroyo
Semiconductor Technology Laboratory, Research and Development Group,
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YOSHINO Masahiro
Advanced Research Institute for Science & Engineering
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Kanehara Takao
Semiconductor Technology Laboratory, Research and Development Group,
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OKINAKA Yutaka
Advanced Research Institute for Science and Engineering, Waseda University
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WAKATSUKI Satoshi
School of Science and Engineering
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MASUDA Toyoto
Advanced Research Institute for Science & Engineering
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YAMACHIKA Noriyuki
School of Science and Engineering
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SASANO Junji
Consolidated Research Institute for Advanced Science and Medical Care, Waseda University
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MATSUDA Itsuaki
Advanced Research Institute for Science & Engineering
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MATSUDA Itsuaki
Advanced Research Institute for Science & Engineering
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Osaka Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University,
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OKINAKA Yutaka
Advanced Research Institute for Science & Engineering
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MASUDA Toyoto
Advanced Research Institute for Science & Engineering
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Sakakibara Akira
School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan
著作論文
- Effects of H_2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr_Bi_Ta_2O_9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method
- Highly Ordered Mesoporous Ni Particles Prepared by Electroless Deposition from Lyotropic Liquid Crystals
- A Wet Process for Forming an Adhesive Copper Layer on Polyimide Film
- Effects of H2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr0.9Bi2.1Ta2O9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method