Koiwa Ichiro | Semiconductor Technology Laboratory, Research and Development Group,

スポンサーリンク

概要

関連著者

Kanehara Takao
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
SAKAKIBARA Akira
School of Science and Engineering, Waseda University
Asami Katsuhiko
Institute For Material Research Tohoku University
Kato Hiroyo
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
Koiwa Ichiro
Semiconductor Technology Laboratory, Research and Development Group,
OSAKA Tetsuya
Advanced Research Institute for Science & Engineering
Kato Hiroyo
Semiconductor Technology Laboratory, Research and Development Group,
Kanehara Takao
Semiconductor Technology Laboratory, Research and Development Group,
Osaka Tetsuya
Advanced Research Institute for Science and Engineering, Waseda University,
Sakakibara Akira
School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan

もっと見る

著作論文

Effects of H2 Sintering and Pt Upper Electrode on Metallic Bi Content in Sr0.9Bi2.1Ta2O9 Thin Films for Ferroelectric Memories Prepared by Sol-Gel Method

スポンサーリンク