Phase Transition in Ferroelectric SrBi_2Ta_2O_9) Thin Films with Change of Heat-treatment Temperature
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-02-15
著者
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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Hashimoto A
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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Hashimoto Akihiro
Optoelectronics Technology Research Laboratory
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Hashimoto A
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
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Ono S
Saitama Univ. Urawa‐shi Jpn
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Seki T
Tokyo Inst. Of Technol. Yokohama‐shi Jpn
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KOIWA Ichiro
Research and Development Group, Oki Electric Industry Co., Ltd.
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Ono S
Institute Of Industrial Science University Of Tokyo
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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HASHIMOTO Akira
Research & Development Department, Tokyo Ohka Kogyo Co., Ltd.
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SAKAKIBARA Akira
Department of Applied Chemistry, Kagami Memorial Laboratory for Material Science and Technology, Was
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SEKI Tomonori
Department of Applied Chemistry, Kagami Memorial Laboratory for Material Science and Technology, Was
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Sakakibara A
Department Of Mechanical Engineering Okayama University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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