Transmission Electron Microscopic Study of Electroless Nickel-Molybdenum-Boron Alloy Films
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概要
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The structure of amorphous and crystalline electroless Ni–Mo–B films was studied by transmission electron microscopy (TEM). The amorphous film in as-deposited conditions was of a completely disordered state with few crystalline regions. This film crystallized by means of nucleation after 300°C annealing; the produced nuclei grew large after 500°C annealing. Two crystalline films in the as-deposited state, plated from 0.005 and 0.010 mol dm-3 Na2MoO4 concentration baths, showed different annealing behavior even though they had almost identical Ni and Mo composition. The former contained amorphous-like regions corresponding to an intermediate state between the amorphous and the crystalline. The latter film was so stable against annealing that the structure of small grains was maintained after 500°C annealing.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-05-20
著者
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Namikawa Tatsuru
Department Of Electronic Chemistry Graduate School At Nagatsuta Tokyo Institute Of Technology
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Yamazaki Yohtaro
Department Of Electronic Chemistry Interdisciplinary Graduate School Of Science And Engineering Toky
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Arai Katsuya
Department of Applied Chemistry, School of Science and Engineering, Waseda University, 3-4-1, Okubo, Shinjuku-ku, Tokyo 169
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Masubuchi Naganori
Department of Applied Chemistry, School of Science and Engineering, Waseda University, 3-4-1, Okubo, Shinjuku-ku, Tokyo 169
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Namikawa Tatsuru
Department of Electronic Chemistry, Graduate School at Nagatsuta, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-ku, Yokohama-shi, Kanagawa 227
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Osaka Tetsuya
Department of Applied Chemistry, School of Science and Engineering, Waseda University, 3-4-1, Okubo, Shinjuku-ku, Tokyo 169
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