Complete magnetic anisotropy films for perpendicular recording prepared by an electroless plating method.
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概要
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A complete magnetic anisotropy film was formed by an electroless plating method for a high-density perpendicular recording medium. The Co alloy plating bath, using ammoniacal malonate–tartrate–succinate mixed complexing agents was studied mainly by varying three main metal ion factors in the bath: <I>i.e.</I>, the concentrations of NiSO<SUB>4</SUB>, NH<SUB>4</SUB>ReO<SUB>4</SUB>, and MnSO<SUB>4</SUB>. The fine columnar structure of magnetic film in a cross section was confirmed by SEM observation. Three different kinds of eight-inch disks A, B, and C, were prepared under selected conditions with magnetic film thickness of 0.50, 0.25, and 0.20 μm respectively. The recording performance was evaluated with a Winchester ring head with a 0.33 μm gap length under various head-medium spacings. A perpendicular recording mode was confirmed, and the following recording densities were obtained: <I>D</I><SUB>50</SUB>=54 and 58 kFRPI for disk A, and 57 and 63 kFRPI for disk B when using 0.20 and 0.15 μm practical usable spacing respectively, and <I>D</I><SUB>50</SUB>=68 kFRPI for disk C when using the more advanced 0.12 μm spacing. It was suggested that the electroless cobalt alloy plating has a high potential as a process for producing perpendicular recording media.
- 公益社団法人 日本化学会の論文
著者
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Okabe Yutaka
Department Of Applied Chemistry Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Matsubara Hiroshi
Deparlment Of Internal Medicine School Of Medicine Kyoto University
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Shiota Norio
Microelectronics Research Labs, NEC Corporation
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Okabe Yutaka
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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Wada Akihide
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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Goto Fumio
Microelectronics Research Labs, NEC Corporation
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Matsubara Hiroshi
Department of Applied Chemistry, School of Science and Engineering, Waseda University
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