Effect of Annealing Method to Crystalize on Sr_<0.9>Bi_<2.3>Ta_2O_<9+α> Thin Film Properties Formed from Alkoxide Solution
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-01-15
著者
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MITA Juro
Research Laboratory, Oki Electric Industry Co., Ltd.
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
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Tani Kouichi
Research And Development Group Oki Electric Industry Co. Ltd.
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KOIWA Ichiro
Research and Development Group, Oki Electric Industry Co., Ltd.
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Tani Kouichi
Research and Development Center, Ricoh Company Ltd.
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