Effects of Ion Etching and Annealing in O_2 Atmosphere Following Ion Etching on Properties and Chemistry of Sr_<0.9>Bi_<2.1>Ta_2O_<9+a> Thin Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-09-30
著者
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浅見 勝彦
東北大学金属材料研究所
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浅見 勝彦
東北大・金研
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Kawashima A
Tohoku Univ. Ibaraki Jpn
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ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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YAMANOBE Tomomi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Yamanobe Tomomi
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Asami Katsuhiko
Institute For Material Research Tohoku University
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Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
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