YAMANOBE Tomomi | Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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概要
関連著者
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YAMANOBE Tomomi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Yamaji T
Tokyo Denki Univ. Tokyo Jpn
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Yamanobe T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Ito T
Osaka Univ. Osaka Jpn
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IGARASHI Yasushi
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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ITO Toshio
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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Igarashi Y
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Igarashi Yasushi
Semiconductor Tech.Lab., Oki Electric Industry Co., Ltd.
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TANI Kouichi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Matsuhashi Hideki
Research Institute of Electrical Communication, Tohoku University
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MATSUHASHI Hideaki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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TANI Keiji
Japan Atomic Energy Research Institute
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Tani K
Research And Development Center Ricoh Company Ltd.
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Matsuhashi H
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Matsuhashi Hideaki
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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浅見 勝彦
東北大学金属材料研究所
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浅見 勝彦
東北大・金研
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Kawashima A
Tohoku Univ. Ibaraki Jpn
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ASAMI Katsuhiko
Institute for Materials Research, Tohoku University
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Yamaji Tetsuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Yamaji Tetsuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Yamanobe Tomomi
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Asami Katsuhiko
Institute For Material Research Tohoku University
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Koiwa Ichiro
Semiconductor R&D Division, Semiconductor Business Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa-cho, Hachioji, Tokyo 193-8550, Japan
著作論文
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Effects of Ion Etching and Annealing in O_2 Atmosphere Following Ion Etching on Properties and Chemistry of Sr_Bi_Ta_2O_ Thin Films
- Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
- Copper Interconnects Fabricated by Dry Etching Process
- High-Reliability Copper Interconnects through Dry Etchirng Process