Matsuhashi H | Oki Electric Ind. Co. Ltd. Tokyo Jpn
スポンサーリンク
概要
関連著者
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Matsuhashi Hideki
Research Institute of Electrical Communication, Tohoku University
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Matsuhashi H
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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MATSUHASHI Hideaki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Matsuhashi Hideaki
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Lee C‐h
Lg Electronics Inst. Technol. Seoul Kor
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Masu K
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu Kazuya
Research Institute Of Electrical Communication Tohoku University
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Lee C‐h
Keimyung Univ. Daegu Kor
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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Masu Kazuya
東工大
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YOKOYAMA Michio
Research Institute of Electrical Communication, Tohoku University
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LEE Chang-Hun
Research Institute of Electrical Communication, Tohoku University
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Lee Chang-hun
Research Institute Of Electrical Communication Tohoku University
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Tsubouchi K
Tohoku Univ. Sendai Jpn
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Yokoyama M
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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Tsubouchi Kazuo
Research Institute Of Electrical Communicaiton Tohoku University
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TSUBOUCHI Kazuo
Research Institute of Electric Communication (RIEC), Tohoku University
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Ohno Shinji
Department Of Chemical Engineering & Technology Faculty Of Engineering Kyushu University
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Ohno S
Semiconductor Tech. Lab. Oki Electric Industry Co. Lid.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co .ltd.
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TANI Kouichi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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GOTOH Akio
Research Institute of Electrical Communication, Tohoku University
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TANI Keiji
Japan Atomic Energy Research Institute
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Tani K
Research And Development Center Ricoh Company Ltd.
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Yamaji T
Tokyo Denki Univ. Tokyo Jpn
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YAMANOBE Tomomi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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NISHIKAWA Satosi
Semiconductor Technology Laboratory, OKI Electric Industry Co., Ltd.
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Yamanobe T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Gotoh Akio
Research Institute Of Electrical Communication Tohoku University
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NISHIMURA Takamasa
Research Institute of Electrical Communication, Tohoku University
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Nishimura Tadashi
Lsi Research & Development Laboratory Mitsubishi Electric Corporation
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Nishimura T
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Niina T
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Lee Chang-Hum
Research Institute of Electrical Communication, Tohoku University
著作論文
- Crystallographic Structures and Parasitic Resistances of Self-Aligned Silicide TiSi_2/Self-Aligned Nitrided Barrier Layer/Selective Chemical Vapor Deposited Aluminum in Fully Self-Aligned Metallization Metal Oxide Semiconductor Field-Effect Transistor
- Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization Metal-Oxide-Semiconductor Field-Effect-Transistor
- Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization MOSFET
- Effect of Gate Materials on Generation of Interface State by Hot-Carrier Injection
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
- Effect of W Film Stress on W-Gate MOS Characteristics
- Evaluation of Laser CVD Tungsten for Gete Electrode : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)