Evaluation of Laser CVD Tungsten for Gete Electrode : Silicon Devices and Process Technologies(<Special Section>Solid State Devices and Materials 1)

スポンサーリンク

概要

著者

関連論文

Evaluation of circulating tumor cells in patients with breast cancer : multi-institutional clinical trial in Japan
Activation of PI3K/Akt signaling and hormone resistance in breast cancer
Laparoscopic Repair of a Perforated Duodenal Ulcer in Two Patients
Preparation of a-Si:H/a-Si_C_x:H Superlattices
Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
Effect of H_2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
Two Components of Light-Induced Photoconductivity Decays in a-Si:H
Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method
Optical Second Harmonic Generation in Alternately Assembled Dye-Polyion Multilayers
Crystallographic Structures and Parasitic Resistances of Self-Aligned Silicide TiSi_2/Self-Aligned Nitrided Barrier Layer/Selective Chemical Vapor Deposited Aluminum in Fully Self-Aligned Metallization Metal Oxide Semiconductor Field-Effect Transistor
Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization Metal-Oxide-Semiconductor Field-Effect-Transistor
Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization MOSFET
Sensitization of Chemotherapy by Anti-HER
Brain Metastasis of Breast Cancer
Effect of Gate Materials on Generation of Interface State by Hot-Carrier Injection
Role of SiN Bond Formed by N_2O-Oxynitridation for Improving Dielectric Properties of Ultrathin SiO_2 Films
Optimum Electrode Materials for Ta_2O_5 Capacitors for High- and Low-Temperature Processes
Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
Effect of W Film Stress on W-Gate MOS Characteristics
Evaluation of Laser CVD Tungsten for Gete Electrode : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
A Novel Clean Ti Salicide Process Using Grooved Gate Structure
5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs
The Dielectric Reliability of Very Thin SiO_2 Films Grown by Rapid Thermal Processing : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
MOS Gate Etching Using an Advanced Magnetron Etching System : Etching and Deposition Technology
Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals
Highly Reliable Thin Nitrided SiO_2 Films Formed by Rapid Thermal Processing in an N_2O Ambient
Initial Growth of Fe Nano-Islands on Cu(001)-c(2×2)N Surfaces
One-Dimensional Self-Organized Patterns on Vicinal Cu(001)-c(2 × 2)N Surfaces
Preparation of Cross-Linked Ultrathin Films Based on Layer-by-Layer Assembly of Polymers
Proposal of Integrated Light Emitting Device Array with Shift Register
Two-Phase Drive Self-Scanning Light-Emitting Device (SLED) Using Coupling Diodes
Team Approach to Providing the Multidisciplinary Medical Treatment Derived by the Patients and Their Family
Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization Metal-Oxide-Semiconductor Field-Effect-Transistor
MOS Gate Etching Using an Advanced Magnetron Etching System

もっと見る

スポンサーリンク