Formation of c-Axis-Oriented Bi_4Ti_3O_<12> Films with Extremely Flat Surface by Spin-Coating
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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TANI Kouichi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Matsuhashi Hideki
Research Institute of Electrical Communication, Tohoku University
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MATSUHASHI Hideaki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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TANI Keiji
Japan Atomic Energy Research Institute
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Tani K
Research And Development Center Ricoh Company Ltd.
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Yamaji T
Tokyo Denki Univ. Tokyo Jpn
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Matsuhashi H
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Matsuhashi Hideaki
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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YAMANOBE Tomomi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Yamanobe T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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