Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Implants into Polysilicon Emitters
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Nishikawa Satoshi
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Ito Shuji
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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