Improvement of the Interface between Selectively Deposited Aluminum and Silicon by Annealing

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Improvement of the Interface between Selectively Deposited Aluminum and Silicon by Annealing
Modeling of Mechanism of Leakage in a Shallow p^+/n Junction Formed by Preamorphization
Structure Analysis of δ-phase in Sb-Te Alloys by HRTEM
Characterizing Metal-Oxide Semiconductor Structures Consisting of HfSiO_x as Gate Dielectrics using Monoenergetic Positron Beams
Effect of Gate Materials on Generation of Interface State by Hot-Carrier Injection
Electron Thermal Diffusivity in JFT-2 Tokamak with NBI Heating
Optimum Electrode Materials for Ta_2O_5 Capacitors for High- and Low-Temperature Processes
Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
A Novel Clean Ti Salicide Process Using Grooved Gate Structure
Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
Structural Analysis of Ag-In-Sb-Te Phase-Change Material(Optics and Quantum Electronics)
MOS Gate Etching Using an Advanced Magnetron Etching System : Etching and Deposition Technology
Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals
Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs
Anomalously Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Phosphorus Implants into Polysilicon Emitters
Determination of Optimum Positions of the Poloidal Field Coils of a Large Tokamak
Self-Aligned SiGe HBTs with Doping Level Inversion Using Selective Epitaxy (Special Issue on Ultra-High-Speed IC and LSI Technology)
Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Implants into Polysilicon Emitters
Effect of Toroidal Field Ripple on Fast Ion Behavior in a Tokamak
Impurity Evolution in a Beam-Heated Tokamak
Effects of Contact-Hole-Etching Damage on Aluminum Chemical Vapor Deposition
Anomalously Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Phosphorus Implants into Polysilicon Emitters
MOS Gate Etching Using an Advanced Magnetron Etching System
Effects of toroidal field ripple on the loss of energetic injected ions and toroidal coil configuration in a tokamak reactor.

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