A Novel Clean Ti Salicide Process Using Grooved Gate Structure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-04-30
著者
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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MATSUHASHI Hideaki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Matsuhashi Hideaki
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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HIZAWA Kazuya
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Hizawa Kazuya
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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- A Novel Clean Ti Salicide Process Using Grooved Gate Structure
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