Formation of c-Axis-Oriented Bi_4Ti_3O_<12> Films with Extremely Flat Surface by Spin-Coating

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Improvement of the Interface between Selectively Deposited Aluminum and Silicon by Annealing
Modeling of Mechanism of Leakage in a Shallow p^+/n Junction Formed by Preamorphization
Structure Analysis of δ-phase in Sb-Te Alloys by HRTEM
Characterizing Metal-Oxide Semiconductor Structures Consisting of HfSiO_x as Gate Dielectrics using Monoenergetic Positron Beams
Preparation of a-Si:H/a-Si_C_x:H Superlattices
Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
Effect of H_2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
Two Components of Light-Induced Photoconductivity Decays in a-Si:H
Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method
Crystallographic Structures and Parasitic Resistances of Self-Aligned Silicide TiSi_2/Self-Aligned Nitrided Barrier Layer/Selective Chemical Vapor Deposited Aluminum in Fully Self-Aligned Metallization Metal Oxide Semiconductor Field-Effect Transistor
Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization Metal-Oxide-Semiconductor Field-Effect-Transistor
Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization MOSFET
Effect of Gate Materials on Generation of Interface State by Hot-Carrier Injection
Electron Thermal Diffusivity in JFT-2 Tokamak with NBI Heating
A Novel Fabrication Technique of Multilayer Stacked Silicon-on-Insulator Structure Applicable to Three-Dimensional ICs
Optimum Electrode Materials for Ta_2O_5 Capacitors for High- and Low-Temperature Processes
Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
Formation of c-Axis-Oriented Bi_4Ti_3O_ Films with Extremely Flat Surface by Spin-Coating
Effect of W Film Stress on W-Gate MOS Characteristics
Evaluation of Laser CVD Tungsten for Gete Electrode : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
A Novel Clean Ti Salicide Process Using Grooved Gate Structure
Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation
Effects of Ion Etching and Annealing in O_2 Atmosphere Following Ion Etching on Properties and Chemistry of Sr_Bi_Ta_2O_ Thin Films
Structural Analysis of Ag-In-Sb-Te Phase-Change Material(Optics and Quantum Electronics)
MOS Gate Etching Using an Advanced Magnetron Etching System : Etching and Deposition Technology
Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals
Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs
Anomalously Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Phosphorus Implants into Polysilicon Emitters
Copper Interconnects Fabricated by Dry Etching Process
Determination of Optimum Positions of the Poloidal Field Coils of a Large Tokamak
Self-Aligned SiGe HBTs with Doping Level Inversion Using Selective Epitaxy (Special Issue on Ultra-High-Speed IC and LSI Technology)
Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Implants into Polysilicon Emitters
Effect of Toroidal Field Ripple on Fast Ion Behavior in a Tokamak
High-Reliability Copper Interconnects through Dry Etchirng Process
Impurity Evolution in a Beam-Heated Tokamak
Effects of Contact-Hole-Etching Damage on Aluminum Chemical Vapor Deposition
Anomalously Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Phosphorus Implants into Polysilicon Emitters
Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization Metal-Oxide-Semiconductor Field-Effect-Transistor
MOS Gate Etching Using an Advanced Magnetron Etching System
Effects of toroidal field ripple on the loss of energetic injected ions and toroidal coil configuration in a tokamak reactor.

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