A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals

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Improvement of the Interface between Selectively Deposited Aluminum and Silicon by Annealing
Modeling of Mechanism of Leakage in a Shallow p^+/n Junction Formed by Preamorphization
Characterizing Metal-Oxide Semiconductor Structures Consisting of HfSiO_x as Gate Dielectrics using Monoenergetic Positron Beams
Preparation of a-Si:H/a-Si_C_x:H Superlattices
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MOS Gate Etching Using an Advanced Magnetron Etching System : Etching and Deposition Technology
Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals
Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
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Anomalously Enhanced Boron Diffusion in the Base of SiGe HBTs Induced by Phosphorus Implants into Polysilicon Emitters
MOS Gate Etching Using an Advanced Magnetron Etching System

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