Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1985-06-20
著者
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Nishikawa Satoshi
Research Laboratory Oki Electric Industry Co. Lid.
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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KAKINUMA Hiroaki
Research Laboratory, OKI Electric Industry Co. Lid.
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WATANABE Tsukasa
Research Laboratory, OKI Electric Industry Co. Lid.
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NIHEI Koji
Research Laboratory, OKI Electric Industry Co. Lid.
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Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Lid.
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Nihei K
Research Laboratory Oki Electric Industry Co. Ltd.
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KAKINUMA Hiroaki
Research Laboratory, Oki Electric Industry Co.,
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WATANABE Tsukasa
Research Laboratory, Oki Electric Industry Co.,
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NISHIKAWA Satoshi
Research Laboratory, Oki Electric Industry Co.,
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