KAKINUMA Hiroaki | Research Laboratory, OKI Electric Industry Co. Lid.
スポンサーリンク
概要
関連著者
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Nishikawa Satoshi
Research Laboratory Oki Electric Industry Co. Lid.
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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KAKINUMA Hiroaki
Research Laboratory, OKI Electric Industry Co. Lid.
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WATANABE Tsukasa
Research Laboratory, OKI Electric Industry Co. Lid.
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Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Lid.
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Nihei K
Research Laboratory Oki Electric Industry Co. Ltd.
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Watanabe Teruo
Futaba Corporation
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Watanabe T
Components Development Group Sony Corporation
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Watanabe Tetsu
Components Development Group Sony Corporation
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NIHEI Kohji
Research Laboratory, Oki Electric Industry Co., Ltd.
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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Kakinuma Hiroaki
The Devices Technology Laboratory Oki Electric Industry Co. Ltd.
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Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Ltd.
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NIHEI Kouji
Research Laboratory, OKI Electric Industry Co. Lid.
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NIHEI Koji
Research Laboratory, OKI Electric Industry Co. Lid.
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Nihei Kohji
Research And Development Division Oki Electric Ind. Co. Ltd.
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FUKUDA Hisashi
Research Laboratory, OKI Electric Industry Co. Lid.
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KAKINUMA Hiroaki
Research Laboratory, Oki Electric Industry Co.,
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WATANABE Tsukasa
Research Laboratory, Oki Electric Industry Co.,
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NISHIKAWA Satoshi
Research Laboratory, OKI Electric Industry Co. Lid.
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NISHIKAWA Satoshi
Research Laboratory, Oki Electric Industry Co.,
著作論文
- Preparation of a-Si:H/a-Si_C_x:H Superlattices
- Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
- Effect of H_2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
- Two Components of Light-Induced Photoconductivity Decays in a-Si:H
- Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
- Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method