NIHEI Kohji | Research Laboratory, Oki Electric Industry Co., Ltd.
スポンサーリンク
概要
関連著者
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NIHEI Kohji
Research Laboratory, Oki Electric Industry Co., Ltd.
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Nihei K
Research Laboratory Oki Electric Industry Co. Ltd.
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Nihei Kohji
Research And Development Division Oki Electric Ind. Co. Ltd.
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Nishikawa Satoshi
Research Laboratory Oki Electric Industry Co. Lid.
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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Watanabe Teruo
Futaba Corporation
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Watanabe T
Components Development Group Sony Corporation
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Watanabe Tetsu
Components Development Group Sony Corporation
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Hayashi T
Research Laboratory Oki Electric Industry Co. Ltd.
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MITA Juro
Research Laboratory, Oki Electric Industry Co., Ltd.
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KOIZUMI Masumi
Research Laboratory, Oki Electric Industry Co., Ltd.
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KANNO Hiromasa
Research Laboratory, Oki Electric Industry Co., Ltd.
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HAYASHI Tadashi
Research Laboratory, Oki Electric Industry Co., Ltd.
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SEKIDO Yoshihiro
Research Laboratory, Oki Electric Industry Co., Ltd.
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ABIKO Ichimatsu
Research Laboratory, Oki Electric Industry Co., Ltd.
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Watanabe Toshihide
Atr Adaptive Communications Research Laboratories:(present Address)science And Technical Research La
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KAKINUMA Hiroaki
Research Laboratory, OKI Electric Industry Co. Lid.
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WATANABE Tsukasa
Research Laboratory, OKI Electric Industry Co. Lid.
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Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Lid.
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Kakinuma Hiroaki
The Devices Technology Laboratory Oki Electric Industry Co. Ltd.
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Kakinuma Hiroaki
Research Laboratory Oki Electric Industry Co. Ltd.
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Hayashi Tadashi
Research Laboratory Oki Electric Co. Ltd.
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Kanno Hiromasa
Research Laboratory Oki Electric Industry Co. Ltd.
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Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
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Koizumi M
Research Laboratory Oki Electric Industry Co. Ltd.
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Abiko Ichimatsu
Research Laboratory Oki Electric Industry Co. Ltd.
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Sekido Yoshihiro
Research Laboratory Oki Electric Co. Ltd.
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NIHEI Kouji
Research Laboratory, OKI Electric Industry Co. Lid.
著作論文
- Difference in Electroluminescent ZnS:Tb,F Thin Films Prepared by Electron-Beam Evaporation and RF Magnetron Sputtering
- Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering
- ZnS:Mn Thin Film Eleetroluminescent Devices Having Doubly-Stacked Insulating Layers
- Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
- Two Components of Light-Induced Photoconductivity Decays in a-Si:H
- Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method