ABIKO Ichimatsu | Research Laboratory, Oki Electric Industry Co., Ltd.
スポンサーリンク
概要
関連著者
-
ABIKO Ichimatsu
Research Laboratory, Oki Electric Industry Co., Ltd.
-
Abiko Ichimatsu
Research Laboratory Oki Electric Industry Co. Ltd.
-
Hayashi T
Research Laboratory Oki Electric Industry Co. Ltd.
-
MITA Juro
Research Laboratory, Oki Electric Industry Co., Ltd.
-
KOIZUMI Masumi
Research Laboratory, Oki Electric Industry Co., Ltd.
-
KANNO Hiromasa
Research Laboratory, Oki Electric Industry Co., Ltd.
-
HAYASHI Tadashi
Research Laboratory, Oki Electric Industry Co., Ltd.
-
SEKIDO Yoshihiro
Research Laboratory, Oki Electric Industry Co., Ltd.
-
NIHEI Kohji
Research Laboratory, Oki Electric Industry Co., Ltd.
-
Hayashi Tadashi
Research Laboratory Oki Electric Co. Ltd.
-
Kanno Hiromasa
Research Laboratory Oki Electric Industry Co. Ltd.
-
Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
-
Nihei K
Research Laboratory Oki Electric Industry Co. Ltd.
-
Nihei Kohji
Research And Development Division Oki Electric Ind. Co. Ltd.
-
Koizumi M
Research Laboratory Oki Electric Industry Co. Ltd.
-
Sekido Yoshihiro
Research Laboratory Oki Electric Co. Ltd.
-
Jiang Yi-chao
Research Laboratory Oki Electric Industry Co. Ltd.
-
Watanabe Nobuaki
Research Laboratory Oki Electric Industry Co. Ltd.
-
Yoshida Mamoru
Research Laboratory Oki Electric Industry Co. Ltd.
-
Nomoto Tutomu
Research Laboratory OKI Electric Industry Co., Ltd.
-
Nomoto Tutomu
Research Laboratory Oki Electric Industry Co. Ltd.
著作論文
- Difference in Electroluminescent ZnS:Tb,F Thin Films Prepared by Electron-Beam Evaporation and RF Magnetron Sputtering
- Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering
- ZnS:Mn Thin Film Eleetroluminescent Devices Having Doubly-Stacked Insulating Layers
- Preparation of Plasma Chemical Vapor Deposition Silicon Nitride Films from SiH_2F_2 and NH_3 Source Gases