Mita J | Research Laboratory Oki Electric Industry Corporation Ltd.
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概要
関連著者
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Mita J
Research Laboratory Oki Electric Industry Corporation Ltd.
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Koiwa Ichiro
Semiconductor Technology Laboratories Oki Electric Industry Co. Ltd.
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Koiwa Ichiro
Department Of Applied Chemistry Science And Engineering Waseda University
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MITA Juro
Research Laboratory, Oki Electric Industry Co., Ltd.
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Koiwa Ichiro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Mita Juro
Microsystem Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Kanehara T
Semiconductor Technology Laboratory Research And Development Group Oki Electric Industry Co. Ltd.
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Osaka T
Department Of Applied Chemistry School Of Science And Engineering Waseda University
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Osaka Tetsuya
Kagami Memorial Laboratory For Materials Science And Technology Waseda University:department Of Appl
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Iwabuchi Toshiyuki
Research And Development Group Oki Electric Industry Co. Ltd.
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Ono S
Saitama Univ. Urawa‐shi Jpn
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KANEHARA Takao
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
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Ono S
Institute Of Industrial Science University Of Tokyo
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Osaka T
Graduate School Of Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Science And Engineering Waseda University
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Osaka Tetsuya
Department Of Applied Chemistry Faculty Of Science And Engineering Waseda University
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Osaka Tetsuya
Graduate School Of Advanced Science And Engineering Waseda University
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Hayashi T
Research Laboratory Oki Electric Industry Co. Ltd.
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KOIZUMI Masumi
Research Laboratory, Oki Electric Industry Co., Ltd.
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KANNO Hiromasa
Research Laboratory, Oki Electric Industry Co., Ltd.
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HAYASHI Tadashi
Research Laboratory, Oki Electric Industry Co., Ltd.
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SEKIDO Yoshihiro
Research Laboratory, Oki Electric Industry Co., Ltd.
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ABIKO Ichimatsu
Research Laboratory, Oki Electric Industry Co., Ltd.
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NIHEI Kohji
Research Laboratory, Oki Electric Industry Co., Ltd.
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Osaka Tetsuya
Faculty Of Science And Engineering Waseda University
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Hayashi Tadashi
Research Laboratory Oki Electric Co. Ltd.
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Kanno Hiromasa
Research Laboratory Oki Electric Industry Co. Ltd.
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Nihei K
Research Laboratory Oki Electric Industry Co. Ltd.
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Nihei Kohji
Research And Development Division Oki Electric Ind. Co. Ltd.
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Koizumi M
Research Laboratory Oki Electric Industry Co. Ltd.
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IWABUCHI Toshiyuki
Microsystem Technology Laboratory, Oki Electric Industry Co., Ltd.
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Abiko Ichimatsu
Research Laboratory Oki Electric Industry Co. Ltd.
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Sekido Yoshihiro
Research Laboratory Oki Electric Co. Ltd.
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山根 久典
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Kobayashi M
Mitsubishi Electric Corp. Hyogo Jpn
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Okada Y
Sumitomo Heavy Ind. Ltd. Tokyo Jpn
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Okada Y
Univ. Tsukuba Ibaraki Jpn
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Okada Y
Institute Of Applied Physics. University Of Tsukuba
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ONO Sachiko
Advanced Research Center of Science and Engineering, Waseda University
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Yamane H
Tohoku Univ. Sendai Jpn
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Yamane Haruki
Research Laboratory Oki Electric Industry Company Ltd.
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Koiwa Ichiro
The Authors Are With Research And Development Group Oki Electric Industry Co. Ltd.
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Okada Yasumasa
Electrotechnical Laboratory
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MITA Juro
The authors are with Microsystems Technology Laboratory, Oki Electric Industry Co., Ltd.
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Ono Sachiko
Advanced Research Center Of Science And Engineering Waseda University
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Yamane Haruki
Research Institute of Advanced Technology, Akita Research and Development Center, Akita 010-1623, Japan
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Hashimoto A
Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn
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Hashimoto Akihiro
Optoelectronics Technology Research Laboratory
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Maeda Masakatsu
Faculty Of Science And Engineering Waseda University
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Yamane Haruki
Research Laboratory, Oki Electric Industry Company, Ltd.
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KOBAYASHI Masanobu
Department of Metallurgical Engineering, Faculty of Engineering, Chiba Institute of Technology
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Hashimoto A
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
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Tani Kouichi
Research And Development Group Oki Electric Industry Co. Ltd.
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Seki T
Tokyo Inst. Of Technol. Yokohama‐shi Jpn
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KOIWA Ichiro
Research and Development Group, Oki Electric Industry Co., Ltd.
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ONO Sachiko
Faculty of Science and Engineering, Waseda University
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OKADA Yukihisa
The authors are with Research and Development Group, Oki Electric Industry Co., Ltd.
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KANEHARA Takao
The authors are with Microsystems Technology Laboratory, Oki Electric Industry Co., Ltd.
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OSAKA Tetsuya
The authors are with the School of Science and Engineering, Waseda University
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ONO Sachiko
The authors are with Advanced Research Institute for Science and Engineering, Waseda University
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SAKAKIBARA Akira
The authors are with the School of Science and Engineering, Waseda University
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SEKI Tomonori
The authors are with the School of Science and Engineering, Waseda University
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OKADA Yukihisa
Microsystems Technology Laboratory, Research and Development Group, Oki Electric Industry Co., Ltd.
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HASHIMOTO Akira
Specialty Development Division 1, Research and Development Department, Tokyo Ohka Kogyo Co., Ltd.
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SAWADA Yoshihiro
Specialty Development Division 1, Research and Development Department, Tokyo Ohka Kogyo Co., Ltd.
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Sawada Y
Research & Development Department Tokyo Ohka Kogyo Co. Ltd.
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Sakakibara A
Department Of Mechanical Engineering Okayama University
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KOBAYASHI Masanobu
Metallurgical Engineering, Chiba Institute of Technology
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Tani Kouichi
Research and Development Center, Ricoh Company Ltd.
著作論文
- Difference in Electroluminescent ZnS:Tb,F Thin Films Prepared by Electron-Beam Evaporation and RF Magnetron Sputtering
- Effects of Annealing on ZnS:Tb, F Electroluminescent Thin Films Prepared by rf Magnetron Sputtering
- ZnS:Mn Thin Film Eleetroluminescent Devices Having Doubly-Stacked Insulating Layers
- Spin-Valve Film for Sensitive Giant Magnetoresistive Sensor Using AC Bias Magnetic Field
- Effect of Annealing Method to Crystalize on Sr_Bi_Ta_2O_ Thin Film Properties Formed from Alkoxide Solution
- Orientation Control of Sr_Bi_Ta_2O_ Thin Films by Chemical Liquid Deposition
- Crystallization of Sr_Bi_Ta_O_ Thin Films by Chemical Liquid Deposition
- Orientation Control of Sr_Bi_Ta_2O_9 Thin Films by Chemical Process
- Crystallization Process of Sr_Bi_Ta_2O_9 Thin Films with Different Crystal Orientation Prepared by Chemical Liquid Deposition Using Alkoxide Precursor(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Role of Excess Bi in SrBi_2Ta_2O_9 Thin Film Prepared Using Chemical Liquid Deposition and Sol-Gel Method
- Preparation of Ferroelectric Sr_Bi_Ta_2O_9 Thin Films by Misted Deposition Method Using Alkoxide Solution(Special Issue on Advanced Memory Devices Using High-ε and Ferroelectric Films)
- Sensitive Giant Magnetoresistive Sensor Using AC Bias Magnetic Field
- A Study on MgO Powder and MgO Liquid Binder in the Screen-Printed Protective Layer for AC-PDPs