Effect of W Film Stress on W-Gate MOS Characteristics
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1989-12-20
著者
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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Ohno Shinji
Department Of Chemical Engineering & Technology Faculty Of Engineering Kyushu University
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Ohno S
Semiconductor Tech. Lab. Oki Electric Industry Co. Lid.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ohno Seigo
Semiconductor Technology Laboratory Oki Electric Industry Co .ltd.
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Matsuhashi Hideki
Research Institute of Electrical Communication, Tohoku University
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MATSUHASHI Hideaki
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.,
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Matsuhashi H
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Matsuhashi Hideaki
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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NISHIKAWA Satosi
Semiconductor Technology Laboratory, OKI Electric Industry Co., Ltd.
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