Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs
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概要
- 論文の詳細を見る
- 1999-09-20
著者
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ITO Tetsuzo
The Institute of Scientific and Industrial Research, Osaka University
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TANI Kouichi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Kasai Masanori
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Kasai Masanori
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
The Authors Are With Research And Development Group Oki Electric Industry Co. Ltd.
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TANI Keiji
Japan Atomic Energy Research Institute
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Ito T
The Institute Of Scientific And Industrial Research Osaka University
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Tani K
Research And Development Center Ricoh Company Ltd.
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IGARASHI Yasushi
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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ITO Toshio
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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Igarashi Y
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Igarashi Yasushi
Semiconductor Tech.Lab., Oki Electric Industry Co., Ltd.
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