Ito T | The Institute Of Scientific And Industrial Research Osaka University
スポンサーリンク
概要
関連著者
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ITO Tetsuzo
The Institute of Scientific and Industrial Research, Osaka University
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Ito T
The Institute Of Scientific And Industrial Research Osaka University
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TANI Kouichi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Kasai Masanori
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Kasai Masanori
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
The Authors Are With Research And Development Group Oki Electric Industry Co. Ltd.
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TANI Keiji
Japan Atomic Energy Research Institute
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Tani K
Research And Development Center Ricoh Company Ltd.
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IGARASHI Yasushi
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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ITO Toshio
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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Igarashi Y
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Igarashi Yasushi
Semiconductor Tech.Lab., Oki Electric Industry Co., Ltd.
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岩崎 裕
大阪大学産業科学研究所
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岩崎 裕
阪大
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GOTOH Masahide
The Institute of Scientific and Industrial Research, Osaka University
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SUDOH Koichi
The Institute of Scient4fic and Industrial Research, Osaka University
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IWASAKI Hiroshi
The Institute of Scient4fic and Industrial Research, Osaka University
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Iwasaki Hiroshi
Institute Of Scientific And Industrial Research Osaka Univerisity
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Sudoh K
Osaka Univ. Osaka Jpn
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Sudoh Koichi
The Institute Of Scient4fic And Industrial Research Osaka University
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Iwasaki Hiroko
Research And Development Center Ricoh Company Ltd.
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Gotoh Midori
The Institute Of Scientific And Industrial Research Osaka University
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Sudoh Koichi
The Institute of Science and Industrial Research, Osaka University
著作論文
- Quantum Yield of Electron-Beam Induced Decomposition of SiO_2 Overlay on Si in Nanolithography Using Scanning Tunneling Microscope : Surfaces, Interfaces, and Films
- Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
- Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs