Sudoh Koichi | The Institute Of Scient4fic And Industrial Research Osaka University
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概要
関連著者
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IWASAKI Hiroshi
The Institute of Scient4fic and Industrial Research, Osaka University
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Sudoh Koichi
The Institute Of Scient4fic And Industrial Research Osaka University
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Sudoh Koichi
The Institute of Science and Industrial Research, Osaka University
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SUDOH Koichi
The Institute of Scient4fic and Industrial Research, Osaka University
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岩崎 裕
阪大
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Sudoh K
Osaka Univ. Osaka Jpn
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岩崎 裕
大阪大学産業科学研究所
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Iwasaki Hiroshi
Institute Of Scientific And Industrial Research Osaka Univerisity
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YOSHINOBU Tatsuo
The Institute of Scientific and Industrial Research, Osaka University
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Yoshinobu T
Osaka Univ. Osaka Jpn
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Yoshinobu Tatsuo
The Institute Of Scientific And Industrial Research Osaka University
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Yoshinobu Tatsuo
Department Of Electrical Engineering Kyoto University:(present Address) The Institute Of Scientific
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Iwasaki Hiroko
Research And Development Center Ricoh Company Ltd.
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岩崎 裕
阪大産研
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GOTOH Masahide
The Institute of Scientific and Industrial Research, Osaka University
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Iwasaki H
The Institute Of Scientific And Industrial Research Osaka University
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Gotoh Midori
The Institute Of Scientific And Industrial Research Osaka University
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KAMETANI Keisuke
The Institute of Scientific and Industrial Research, Osaka University
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Shimizu Ryosuke
Device Technology Laboratory Fuji Electric Advanced Technology Co. Ltd.
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Kametani Keisuke
The Institute Of Scientific And Industrial Research Osaka University
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Kuribayashi Hitoshi
Device Technology Laboratory, Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390-0821, Japan
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Hiruta Reiko
Device Technology Laboratory, Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390-0821, Japan
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阿久津 典子
大阪電通大工
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Yamamoto S
Japan Atomic Energy Research Institute Department Of Fusion Plasma Research Experimental Plasma Phys
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ITO Tetsuzo
The Institute of Scientific and Industrial Research, Osaka University
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MATSUKAWA Shinji
The Institute of Scientific and Industrial Research, Osaka University
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Ueda Naotaka
The Institute of Scientific and Industrial Research, Osaka University
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Li Nan
The Institute of Scientific and Industrial Research, Osaka University
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Ueda Naotaka
The Institute Of Scientific And Industrial Research Osaka University
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Sudoh Koichi
The Institute Of Scientific And Industrial Research Osaka University
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Sudoh Koichi
Institute Of Science And Industrial Research Osaka Univ.
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AKUTSU Noriko
Faculty of Engineering,Osaka Electro-Communication University
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AKUTSU Yasuhiro
Department of Physics,Faculty of Science,Osaka University
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YAMAMOTO Takao
Department of Physics,Faculty of Engineering,Gunma University
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Li Nan
The Institute Of Scientific And Industrial Research Osaka University
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Li Nan
Department Of Mechatronics And Precision Engineering Tohoku University
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AKUTSU Yasuhiro
Institute of Physics, College of general Education University of Tokyo
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Yamamoto T
Japan Atomic Energy Research Inst. Tokai
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Akutsu Y
Osaka Univ. Toyonaka Jpn
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Nakao Motoi
Research Institute For Advanced Science And Technology Osaka Prefecture Univ.
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Liu Hongwen
The Institute Of Scientific And Industrial Research Osaka University
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Ito T
The Institute Of Scientific And Industrial Research Osaka University
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Akutsu Noriko
Faculty Of Engineering Osaka Electro-communication University
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IZUMI Katsutoshi
Research Center for Micro-Structure Devices, Nagoya Institute of Technology
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Akutsu Yasuhiro
Department Of Physics Faculty Of Science Osaka University
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IIKAWA Hirofumi
Research Institute for Advanced Science and Technology, Osaka Prefecture University
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Iikawa Hirofumi
Research Institute For Advanced Science And Technology Osaka Prefecture Univ.
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Izumi Katsutoshi
Research Institute For Advanced Science And Technology Osaka Prefecture Univ.
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Izumi Katsutoshi
Research And Development Bureau N.t.t.
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Matsukawa S
Sumitomo Electric Ind. Ltd. Osaka Jpn
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Yamamoto Takao
Department Of Nuclear Engineering Osaka University
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AKUTSU Yasuhiro
Institute of Physics, College of Arts and Sciences University of Tokyo
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Ueda Naotada
The Institute of Scientific and Industrial Research, Osaka University
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Han Tie-Zhu
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Nishitani Ryusuke
Division of Quantum Physics, Department of Basic Sciences, Kyushu Institute of Technology, Kitakyushu 804-8550, Japan
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Shimizu Ryosuke
Device Technology Laboratory, Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390-0821, Japan
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Sudoh Koichi
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Sudoh Koichi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Iwasaki Hiroshi
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Liu Hongwen
The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka 567-0047, Japan
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Iwasaki Hiroshi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
著作論文
- Interface Morphology of Thermal-Oxide/Si(001) Studied by Scanning Tunneling Microscopy
- Quantum Yield of Electron-Beam Induced Decomposition of SiO_2 Overlay on Si in Nanolithography Using Scanning Tunneling Microscope : Surfaces, Interfaces, and Films
- Electron Tunneling through SiO_2/Si Structures in Scanning Tunneling Microscopy : Surfaces, Interfaces, and Films
- Nanopit Formation and Manipulation of Steps on Si(001)at High Temperatures with a Scanning Tunneling Microscope
- Current-Induced Step Bunching on Vicinal Si(111)Studied by Light Scattering
- Controllable Nanopit Formation on Si(001) with a Scanning Tunneling Microscope
- Scanning Tunneling Microscopy Study of Faceting on Vicinal Si(113)
- Fluctuations of a Single Step and surface Height on Vicinal Surfaces
- Selective Reaction of Ferrocene with Si(111) Using a CaF Mask
- Epitaxial Growth of CaF_2 Films on Si(111) Studied by Scanning Tunneling Microscopy(Surfaces, Interfaces, and Films)
- Simulation Method for Buried Oxide Formation of Separation by Implanted Oxygen Structure during Post-Implantation Thermal Annealing
- Electron Tunneling Through an A1_2O_3 Thin Film on NiAl(110) in Scanning Tunneling Microscopy
- Anomalous Enhancement of Scanning Tunneling Microscope-Excited Light Emission from Gold Films on Graphite Substrate
- Investigation of Shape Transformation of Silicon Trenches during Hydrogen Annealing
- Numerical Study on Shape Transformation of Silicon Trenches by High-Temperature Hydrogen Annealing