Shimizu Ryosuke | Device Technology Laboratory Fuji Electric Advanced Technology Co. Ltd.
スポンサーリンク
概要
関連著者
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IWASAKI Hiroshi
The Institute of Scient4fic and Industrial Research, Osaka University
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Sudoh Koichi
The Institute Of Scient4fic And Industrial Research Osaka University
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Shimizu Ryosuke
Device Technology Laboratory Fuji Electric Advanced Technology Co. Ltd.
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Kuribayashi Hitoshi
Device Technology Laboratory, Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390-0821, Japan
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Hiruta Reiko
Device Technology Laboratory, Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390-0821, Japan
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Sudoh Koichi
The Institute of Science and Industrial Research, Osaka University
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Shimizu Ryosuke
Device Technology Laboratory, Fuji Electric Advanced Technology Co., Ltd., 4-18-1 Tsukama, Matsumoto, Nagano 390-0821, Japan
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Sudoh Koichi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Iwasaki Hiroshi
The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
著作論文
- Investigation of Shape Transformation of Silicon Trenches during Hydrogen Annealing
- Numerical Study on Shape Transformation of Silicon Trenches by High-Temperature Hydrogen Annealing