Igarashi Yasushi | Semiconductor Tech.Lab., Oki Electric Industry Co., Ltd.
スポンサーリンク
概要
関連著者
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IGARASHI Yasushi
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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Igarashi Y
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Igarashi Yasushi
Semiconductor Tech.Lab., Oki Electric Industry Co., Ltd.
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ITO Toshio
Semiconductor technology Laboratory, OKI Electric Industry Co., Ltd.
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Yamaji T
Tokyo Denki Univ. Tokyo Jpn
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Yamanobe T
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Ito T
Osaka Univ. Osaka Jpn
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YAMANOBE Tomomi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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ITO Tetsuzo
The Institute of Scientific and Industrial Research, Osaka University
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Nishikawa S
Mitsubishi Electric Corp. Hyogo Jpn
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TANI Kouichi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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NISHIKAWA Satoshi
Semiconductor Tech. Lab., Oki Electric Industry Co., Ltd.
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Yamaji Tetsuo
Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd.
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Kasai Masanori
Semiconductor Tech.lab. Oki Electric Industry Co. Ltd.
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Kasai Masanori
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
Semiconductor R&d Division Semiconductor Business Group Oki Electric Industry Co. Ltd.
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Ashikaga Kinya
The Authors Are With Research And Development Group Oki Electric Industry Co. Ltd.
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TANI Keiji
Japan Atomic Energy Research Institute
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Nishikawa Satoshi
Semiconductor Tech. Lab. Oki Electric Industry Co. Ltd.
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Ito T
The Institute Of Scientific And Industrial Research Osaka University
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Tani K
Research And Development Center Ricoh Company Ltd.
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Yamaji Tetsuo
Semiconductor Technology Laboratory Oki Electric Industry Co. Ltd.
著作論文
- Thermal Stability of Interconnect of TiN/Cu/TiN Multilayered Structure
- A New Mechanism of Failure in Silicon p^+/n Junction Induced by Diffusion Barrier Metals
- Submicron Ferroelectric Capacitors Fabricated by Chemical Mechanical Polishing Process for High-Density Ferroelectric Memories
- Submicron Ferroelectric Capacitors Fabricated by CMP Process for High-Density FeRAMs
- Copper Interconnects Fabricated by Dry Etching Process
- High-Reliability Copper Interconnects through Dry Etchirng Process